Plasma Technology Patent Application Trends 2024

Plasma Technology patent applications in 2025

Top Technology Areas in Plasma Technology

Top CPC Codes

• H01J2237/334 (No explanation available)
  • Count: 83 patents
  • Example: 20240234097. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/32715 (No explanation available)
  • Count: 66 patents
  • Example: 20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)
• H01J37/32449 (No explanation available)
  • Count: 50 patents
  • Example: 20240234113. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/32183 (No explanation available)
  • Count: 46 patents
  • Example: 20240234092. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/32568 (No explanation available)
  • Count: 42 patents
  • Example: 20240234104. MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE (Lam Research Corporation)
• H01J37/3244 (No explanation available)
  • Count: 38 patents
  • Example: 20240234096. PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
• H01J37/32091 (No explanation available)
  • Count: 35 patents
  • Example: 20240234087. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS (Applied Materials, Inc.)
• H01J37/32724 (No explanation available)
  • Count: 34 patents
  • Example: 20240234099. FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/32174 (No explanation available)
  • Count: 34 patents
  • Example: 20240429027. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/32642 (No explanation available)
  • Count: 33 patents
  • Example: 20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)

Top Companies in Plasma Technology

Tokyo Electron Limited

• Number of Plasma Technology patents: 167
• Top CPC codes:
  • H01J2237/334 (No explanation available): 40 patents
  • H01J37/32715 (No explanation available): 39 patents
  • H01J37/32449 (No explanation available): 29 patents
• Recent patents:
  • 20240047182. PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited) (20240208)
  • 20240047184. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240208)
  • 20240049379. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240208)

Applied Materials, Inc.

• Number of Plasma Technology patents: 36
• Top CPC codes:
  • H01J37/32183 (No explanation available): 11 patents
  • H01J37/32128 (No explanation available): 10 patents
  • H01J2237/3341 (No explanation available): 8 patents
• Recent patents:
  • 20240321610. SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR (Applied Materials, Inc.) (20240926)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
  • 20240047246. ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240208)

Lam Research Corporation

• Number of Plasma Technology patents: 22
• Top CPC codes:
  • H01L21/67069 (No explanation available): 7 patents
  • H01L21/6833 (No explanation available): 7 patents
  • H01L21/67109 (No explanation available): 5 patents
• Recent patents:
  • 20240363311. RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN RESPONSE TO SUBSTRATE BULK RESISTIVITY VARIATIONS (Lam Research Corporation) (20241031)
  • 20240218509. MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA (Lam Research Corporation) (20240704)
  • 20240322781. Multiple-Output Radiofrequency Matching Module and Associated Methods (Lam Research Corporation) (20240926)

Hitachi High-Tech Corporation

• Number of Plasma Technology patents: 17
• Top CPC codes:
  • H01J2237/334 (No explanation available): 4 patents
  • H01J37/32174 (No explanation available): 3 patents
  • H01J37/32715 (No explanation available): 3 patents
• Recent patents:
  • 20240047181. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20240208)
  • 20240047239. PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20240208)
  • 20240047258. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20240208)

TOKYO ELECTRON LIMITED

• Number of Plasma Technology patents: 14
• Top CPC codes:
  • H01J2237/334 (No explanation available): 3 patents
  • H01J37/32247 (No explanation available): 3 patents
  • H01J37/32513 (No explanation available): 2 patents
• Recent patents:
  • 20240331977. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20241003)
  • 20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240125)
  • 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED) (20240125)

HITACHI HIGH-TECH CORPORATION

• Number of Plasma Technology patents: 11
• Top CPC codes:
  • H01J2237/334 (No explanation available): 6 patents
  • H01J37/32449 (No explanation available): 3 patents
  • H01J37/32972 (No explanation available): 3 patents
• Recent patents:
  • 20240194461. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20240613)
  • 20240222096. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION) (20240704)
  • 20240331974. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION) (20241003)

SAMSUNG ELECTRONICS CO., LTD.

• Number of Plasma Technology patents: 8
• Top CPC codes:
  • H01J2237/334 (No explanation available): 4 patents
  • H01J37/3244 (No explanation available): 3 patents
  • H01J37/32642 (No explanation available): 3 patents
• Recent patents:
  • 20240212992. PLASMA PROCESSING APPARATUS AND METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240627)
  • 20240096649. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240321)
  • 20240038536. PLASMA PROCESSING APPARATUS, WAFER TO WAFER BONDING SYSTEM AND WAFER TO WAFER BONDING METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240201)

DISCO CORPORATION

• Number of Plasma Technology patents: 7
• Top CPC codes:
  • H01L21/304 (No explanation available): 3 patents
  • H01L21/3065 (No explanation available): 3 patents
  • H01L24/80 (No explanation available): 2 patents
• Recent patents:
  • 20240136193. METHOD OF PROCESSING WAFER (DISCO CORPORATION) (20240425)
  • 20240058898. WAFER PROCESSING METHOD (DISCO CORPORATION) (20240222)
  • 20240112955. MANUFACTURING METHOD OF CHIPS (DISCO CORPORATION) (20240404)

Advanced Energy Industries, Inc.

• Number of Plasma Technology patents: 7
• Top CPC codes:
  • H01J37/32174 (No explanation available): 2 patents
  • H01J37/32935 (No explanation available): 2 patents
  • H01L21/67069 (No explanation available): 2 patents
• Recent patents:
  • 20240071721. SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS (Advanced Energy Industries, Inc.) (20240229)
  • 20240194452. BIAS SUPPLY WITH RESONANT SWITCHING (Advanced Energy Industries, Inc.) (20240613)
  • 20240030001. BIAS SUPPLY WITH A SINGLE CONTROLLED SWITCH (Advanced Energy Industries, Inc.) (20240125)

Taiwan Semiconductor Manufacturing Company, Ltd.

• Number of Plasma Technology patents: 6
• Top CPC codes:
  • H01L21/32136 (No explanation available): 2 patents
  • H01L21/0337 (No explanation available): 2 patents
  • H01L29/66795 (No explanation available): 2 patents
• Recent patents:
  • 20240404860. PLASMA PROCESSING APPARATUS AND METHOD (Taiwan Semiconductor Manufacturing Company, Ltd.) (20241205)
  • 20240168371. SELECTIVE HARDMASK ON HARDMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20240523)
  • 20240363450. METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCTOR PACKAGE AND PHOTORESIST SCUM DETECTION APPARATUS (Taiwan Semiconductor Manufacturing Company, Ltd.) (20241031)

New Companies in Plasma Technology (Last Month)

File:New Companies in Plasma Technology Last Month.png

No new companies detected in the last month.

Emerging Technology Areas in Plasma Technology

• H01L21/67063 (No explanation available)
  • Count: 1 patents
  • Example: 20240047258. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation)
• C23C4/04 (No explanation available)
  • Count: 1 patents
  • Example: 20240043982. THERMAL SPRAY MATERIAL, THERMAL SPRAY COATING, METHOD FOR FORMING THERMAL SPRAY COATING, AND COMPONENT FOR PLASMA ETCHING DEVICE (TOCALO Co., Ltd.)
• G03F7/70633 (No explanation available)
  • Count: 1 patents
  • Example: 20240030073. ETCH MONITORING AND PERFORMING (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
• H01J2237/24578 (No explanation available)
  • Count: 1 patents
  • Example: 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED)
• G05B15/02 (No explanation available)
  • Count: 1 patents
  • Example: 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED)
• G01N25/72 (No explanation available)
  • Count: 1 patents
  • Example: 20240030012. DETECTION METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• G01M3/002 (No explanation available)
  • Count: 1 patents
  • Example: 20240030012. DETECTION METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J2237/3342 (No explanation available)
  • Count: 1 patents
  • Example: 20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H05B6/62 (No explanation available)
  • Count: 1 patents
  • Example: 20240030009. PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROLLING METHOD (Tokyo Electron Limited)
• H05B6/54 (No explanation available)
  • Count: 1 patents
  • Example: 20240030009. PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROLLING METHOD (Tokyo Electron Limited)

Top Companies in Emerging Plasma Technology Technologies

• Tokyo Electron Limited: 5 patents
• TOKYO ELECTRON LIMITED: 2 patents
• Hitachi High-Tech Corporation: 1 patents
• TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
• TOCALO Co., Ltd.: 1 patents

Top Inventors in Plasma Technology

Kartik RAMASWAMY of San Jose CA (US)

• Number of Plasma Technology patents: 13
• Top companies:
  • Applied Materials, Inc.: 13 patents
• Recent patents:
  • 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
  • 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)

Yue GUO of Redwood City CA (US)

• Number of Plasma Technology patents: 11
• Top companies:
  • Applied Materials, Inc.: 11 patents
• Recent patents:
  • 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
  • 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)

Chishio KOSHIMIZU

• Number of Plasma Technology patents: 11
• Top companies:
  • Tokyo Electron Limited: 11 patents
• Recent patents:
  • 20240112895. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20240404)
  • 20240087857. PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT (Tokyo Electron Limited) (20240314)
  • 20240331978. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20241003)

Taro IKEDA

• Number of Plasma Technology patents: 11
• Top companies:
  • Tokyo Electron Limited: 9 patents
  • TOKYO ELECTRON LIMITED: 2 patents
• Recent patents:
  • 20240170260. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240523)
  • 20240038500. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240201)
  • 20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240125)

Sergey Voronin of Albany NY (US)

• Number of Plasma Technology patents: 8
• Top companies:
  • Tokyo Electron Limited: 8 patents
• Recent patents:
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
  • 20240096600. Substrate Bombardment with Ions having Targeted Mass using Pulsed Bias Phase Control (Tokyo Electron Limited) (20240321)
  • 20240331979. Apparatus and Methods for Plasma Processing (Tokyo Electron Limited) (20241003)

Yang YANG of San Diego CA (US)

• Number of Plasma Technology patents: 8
• Top companies:
  • Applied Materials, Inc.: 8 patents
• Recent patents:
  • 20240177969. SOLID-STATE SWITCH BASED HIGH-SPEED PULSER WITH PLASMA IEDF MODIFICATION CAPABILITY THROUGH MULTILEVEL OUTPUT FUNCTIONALITY (Applied Materials, Inc.) (20240530)
  • 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
  • 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)

Kazushi KANEKO

• Number of Plasma Technology patents: 8
• Top companies:
  • Tokyo Electron Limited: 5 patents
  • TOKYO ELECTRON LIMITED: 3 patents
• Recent patents:
  • 20240203692. PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD (Tokyo Electron Limited) (20240620)
  • 20240371603. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING METHOD, ANALYSIS METHOD, AND STORAGE MEDIUM (Tokyo Electron Limited) (20241107)
  • 20240136154. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240425)

Eiki KAMATA

• Number of Plasma Technology patents: 8
• Top companies:
  • TOKYO ELECTRON LIMITED: 4 patents
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240170260. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240523)
  • 20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240125)
  • 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED) (20240125)

Peter Lowell George Ventzek of Austin TX (US)

• Number of Plasma Technology patents: 8
• Top companies:
  • Tokyo Electron Limited: 8 patents
• Recent patents:
  • 20240347317. Method and System for Plasma Processing (Tokyo Electron Limited) (20241017)
  • 20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited) (20240201)
  • 20240363310. Balanced RF Resonant Antenna System (Tokyo Electron Limited) (20241031)

Maju TOMURA

• Number of Plasma Technology patents: 7
• Top companies:
  • Tokyo Electron Limited: 7 patents
• Recent patents:
  • 20240153744. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)
  • 20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240926)
  • 20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240125)

Masaki HIRAYAMA

• Number of Plasma Technology patents: 7
• Top companies:
  • Tokyo Electron Limited: 6 patents
  • TOKYO ELECTRON LIMITED: 1 patents
• Recent patents:
  • 20240071730. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240229)
  • 20240087849. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240314)
  • 20240321550. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240926)

Barton Lane of Austin TX (US)

• Number of Plasma Technology patents: 6
• Top companies:
  • Tokyo Electron Limited: 6 patents
• Recent patents:
  • 20240203713. IN-SITU DIAGNOSIS OF PLASMA SYSTEM (Tokyo Electron Limited) (20240620)
  • 20240213005. System and Method for Plasma Processing (Tokyo Electron Limited) (20240627)
  • 20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited) (20240201)

Blaze Messer of Albany NY (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Yan Chen of Fremont CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Joel Ng of Fremont CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Ashawaraya Shalini of Fremont CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Ying Zhu of Fremont CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Merritt Funk of Austin TX (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240380114. Parallel Resonance Antenna for Radial Plasma Control (Tokyo Electron Limited) (20241114)
  • 20240203713. IN-SITU DIAGNOSIS OF PLASMA SYSTEM (Tokyo Electron Limited) (20240620)
  • 20240213005. System and Method for Plasma Processing (Tokyo Electron Limited) (20240627)

Keren J. KANARIK of Los Altos CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Lam Research Corporation: 5 patents
• Recent patents:
  • 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)

Samantha SiamHwa TAN of Newark CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Lam Research Corporation: 5 patents
• Recent patents:
  • 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)

Yang PAN of Los Altos CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Lam Research Corporation: 5 patents
• Recent patents:
  • 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)

Jeffrey MARKS of Saratoga CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Lam Research Corporation: 5 patents
• Recent patents:
  • 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
  • 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)

Linying CUI of Cupertino CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Applied Materials, Inc.: 5 patents
• Recent patents:
  • 20240194446. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
  • 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)

James ROGERS of Los Gatos CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Applied Materials, Inc.: 5 patents
• Recent patents:
  • 20240194446. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
  • 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)

Rajinder DHINDSA of Pleasanton CA (US)

• Number of Plasma Technology patents: 5
• Top companies:
  • Applied Materials, Inc.: 5 patents
• Recent patents:
  • 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
  • 20240321610. SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR (Applied Materials, Inc.) (20240926)
  • 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)

Koki MUKAIYAMA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240213032. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240627)
  • 20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240926)
  • 20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240125)

Yoshihide KIHARA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240203698. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240620)
  • 20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240926)
  • 20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240125)

Shinji HIMORI

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
  • 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
  • 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)

A N M Wasekul AZAD of Santa Clara CA (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Applied Materials, Inc.: 4 patents
• Recent patents:
  • 20240290578. RADIO FREQUENCY DIVERTER ASSEMBLY ENABLING ON-DEMAND DIFFERENT SPATIAL OUTPUTS (Applied Materials, Inc.) (20240829)
  • 20240079212. SCANNING IMPEDANCE MEASUREMENT IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240307)
  • 20240177968. SYSTEM AND METHODS FOR IMPLEMENTING A MICRO PULSING SCHEME USING DUAL INDEPENDENT PULSERS (Applied Materials, Inc.) (20240530)

Atsushi TAKAHASHI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240112918. PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING METHOD (Tokyo Electron Limited) (20240404)
  • 20240112922. ETCHING METHOD AND PLASMA PROCESSING SYSTEM (Tokyo Electron Limited) (20240404)
  • 20240153744. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)

Kazuki MOYAMA

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240213000. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240627)
  • 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240047184. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240208)

Mitsunori Ohata

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240339297. PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS (Tokyo Electron Limited) (20241010)
  • 20240347317. Method and System for Plasma Processing (Tokyo Electron Limited) (20241017)
  • 20240363310. Balanced RF Resonant Antenna System (Tokyo Electron Limited) (20241031)

Gen TAMAMUSHI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240170258. PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20240523)
  • 20240222078. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (Tokyo Electron Limited) (20240704)
  • 20240153742. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)

Hiroyuki MATSUURA

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240014013. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20240111)
  • 20240018660. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20240118)
  • 20240170265. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240523)

Satoru KAWAKAMI

• Number of Plasma Technology patents: 4
• Top companies:
  • TOKYO ELECTRON LIMITED: 2 patents
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20240203692. PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD (Tokyo Electron Limited) (20240620)
  • 20240038500. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240201)
  • 20240331977. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20241003)

Shota YOSHIMURA

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240212987. GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS, AND GAS CONTROL METHOD (Tokyo Electron Limited) (20240627)
  • 20240071727. SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240229)
  • 20240071728. SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240229)

Jianping Zhao of Austin TX (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240203706. ALD PROCESS WITH PLASMA TREATMENT (Tokyo Electron Limited) (20240620)
  • 20240021410. Plasma Processing with Broadband RF Waveforms (Tokyo Electron Limited) (20240118)
  • 20240170256. VHF Broadband Coaxial Adapter (Tokyo Electron Limited) (20240523)

Qiang Wang of Austin TX (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240339297. PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS (Tokyo Electron Limited) (20241010)
  • 20240347317. Method and System for Plasma Processing (Tokyo Electron Limited) (20241017)
  • 20240363310. Balanced RF Resonant Antenna System (Tokyo Electron Limited) (20241031)

Shin YAMAGUCHI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240194457. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240194458. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240153749. STAGE AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)

Makoto KATO

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240194514. SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240087857. PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT (Tokyo Electron Limited) (20240314)
  • 20240047182. PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited) (20240208)

Hajime TAMURA

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240194457. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240194458. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240153749. STAGE AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)

Kazuya NAGASEKI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
  • 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
  • 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)

Satoru TERUUCHI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
  • 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
  • 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)

Yasuharu SASAKI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240194457. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240194458. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
  • 20240153749. STAGE AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)

Naoki MATSUMOTO

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20240222075. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240704)
  • 20240030012. DETECTION METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240125)
  • 20240030014. SEASONING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240125)

Da Song of Albany NY (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20240230409. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240711)
  • 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
  • 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)

Shin MATSUURA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 2 patents
  • TOKYO ELECTRON LIMITED: 1 patents
• Recent patents:
  • 20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited) (20240711)
  • 20240371609. PLASMA PROCESSING APPARATUS (TOKYO ELECTRON LIMITED) (20241107)
  • 20240136158. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited) (20240425)

Chelsea DuBose of Austin TX (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20240258074. Antenna Plane Magnets for Improved Performance (Tokyo Electron Limited) (20240801)
  • 20240162619. Parallel Resonance Antenna for Radial Plasma Control (Tokyo Electron Limited) (20240516)
  • 20240380114. Parallel Resonance Antenna for Radial Plasma Control (Tokyo Electron Limited) (20241114)

Justin Moses of Austin TX (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20240258074. Antenna Plane Magnets for Improved Performance (Tokyo Electron Limited) (20240801)
  • 20240162619. Parallel Resonance Antenna for Radial Plasma Control (Tokyo Electron Limited) (20240516)
  • 20240380114. Parallel Resonance Antenna for Radial Plasma Control (Tokyo Electron Limited) (20241114)

Hiroyuki MIYASHITA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20240297018. DISTRIBUTOR AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240905)
  • 20240297020. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240905)
  • 20240212985. FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240627)

Top Collaborations in Plasma Technology

Top US States for Plasma Technology Inventors

Top Cities for Plasma Technology Inventors

• Miyagi: 188 inventors
• Tokyo: 121 inventors
• Kurokawa-gun: 72 inventors
• Suwon-si: 64 inventors
• Austin: 51 inventors
• Yamanashi: 44 inventors
• Fremont: 43 inventors
• Santa Clara: 41 inventors
• San Jose: 41 inventors
• Albany: 40 inventors
• Hsinchu: 22 inventors
• Seoul: 20 inventors
• Nirasaki City: 18 inventors
• Sunnyvale: 15 inventors
• Pleasanton: 13 inventors
• Portland: 13 inventors
• Redwood City: 12 inventors
• Nirasaki City, Yamanashi: 11 inventors
• Shanghai: 11 inventors
• Saratoga: 10 inventors