View source for US Patent Application 17746381. INTEGRATED CIRCUITS HAVING SIGNAL LINES FORMED WITH DOUBLE PATTERNING simplified abstract

=INTEGRATED CIRCUITS HAVING SIGNAL LINES FORMED WITH DOUBLE PATTERNING=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Chung-Chieh Yang of Hsinchu (TW)|Chung-Chieh Yang of Hsinchu (TW)]][[Category:Chung-Chieh Yang of Hsinchu (TW)]]

[[:Category:Ching-Ting Lu of Hsinchu (TW)|Ching-Ting Lu of Hsinchu (TW)]][[Category:Ching-Ting Lu of Hsinchu (TW)]]

[[:Category:Yung-Chow Peng of Hsinchu (TW)|Yung-Chow Peng of Hsinchu (TW)]][[Category:Yung-Chow Peng of Hsinchu (TW)]]

==INTEGRATED CIRCUITS HAVING SIGNAL LINES FORMED WITH DOUBLE PATTERNING - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17746381 titled 'INTEGRATED CIRCUITS HAVING SIGNAL LINES FORMED WITH DOUBLE PATTERNING

==Simplified Explanation==

The patent application describes an integrated circuit that includes metal conducting lines in a metal layer over an insulation layer on a substrate.
* Metal conducting lines are arranged in an array.
* A first metal segment lineup is present between two metal conducting lines in the array.
* An electric circuit is connected to the first and second metal conducting lines.
* The first and second metal conducting lines have equal lengths.


==Original Abstract Submitted==

An integrated circuit includes an array of metal conducting lines in a metal layer overlying an insulation layer supported by a substrate, a first metal segment lineup having multiple metal segments in the metal layer between a first metal conducting line and a second metal conducting line in the array of metal conducting lines, and an electric circuit having a first input and a second input. The first input is connected to the first metal conducting line and the second input is connected to the second metal conducting line, and a first length of the first metal conducting line is equal to a second length of the second metal conducting line.



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