View source for Taiwan semiconductor manufacturing company, ltd. (20240103358). SYSTEM AND STRUCTURE INCLUDING A PELLICLE simplified abstract

=SYSTEM AND STRUCTURE INCLUDING A PELLICLE=


==Organization Name==

[[:Category:taiwan semiconductor manufacturing company, ltd.|taiwan semiconductor manufacturing company, ltd.]]


[[Category:taiwan semiconductor manufacturing company, ltd.]]

==Inventor(s)==

[[:Category:Chue San Yoo of Hsinchu (TW)|Chue San Yoo of Hsinchu (TW)]][[Category:Chue San Yoo of Hsinchu (TW)]]

[[:Category:Hsin-Chang Lee of Hsinchu (TW)|Hsin-Chang Lee of Hsinchu (TW)]][[Category:Hsin-Chang Lee of Hsinchu (TW)]]

[[:Category:Pei-Cheng Hsu of Hsinchu (TW)|Pei-Cheng Hsu of Hsinchu (TW)]][[Category:Pei-Cheng Hsu of Hsinchu (TW)]]

[[:Category:Yun-Yue Lin of Hsinchu (TW)|Yun-Yue Lin of Hsinchu (TW)]][[Category:Yun-Yue Lin of Hsinchu (TW)]]

==SYSTEM AND STRUCTURE INCLUDING A PELLICLE - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240103358 titled 'SYSTEM AND STRUCTURE INCLUDING A PELLICLE

==Simplified Explanation==

The patent application describes a system with a mask and a pellicle frame attached to the mask, including a check valve for gas flow. The pellicle frame has a flat bottom surface with a single recess, free of adhesive, containing a gasket.

* The system includes a mask and a pellicle frame attached to the mask.
* The pellicle frame has a check valve for gas flow from one side to the other.
* The flat bottom surface of the pellicle frame has a single recess with a gasket inside.

== Potential Applications ==
This technology could be applied in the manufacturing of semiconductor devices, optical components, and other industries requiring contamination control in cleanroom environments.

== Problems Solved ==
This technology solves the problem of preventing contamination on sensitive surfaces during manufacturing processes by providing a sealed environment with controlled gas flow.

== Benefits ==
The benefits of this technology include improved product quality, increased yield rates, and reduced maintenance costs due to minimized contamination risks.

== Potential Commercial Applications ==
"Contamination Control System for Cleanroom Environments" could be a suitable title for this section. The technology could be commercialized in the semiconductor industry, optics industry, and other high-tech manufacturing sectors.

== Possible Prior Art ==
There may be prior art related to contamination control systems in cleanroom environments, but specific examples are not provided in the abstract.

=== Unanswered Questions ===

=== How does the check valve operate within the pellicle frame to control gas flow? ===
The abstract mentions a check valve for gas flow, but it does not elaborate on the mechanism or design of this valve within the pellicle frame.

=== What materials are used in the construction of the pellicle frame and gasket to ensure compatibility with cleanroom environments? ===
The abstract does not specify the materials used in the pellicle frame and gasket, which are crucial for maintaining cleanliness and preventing contamination in sensitive manufacturing processes.


==Original Abstract Submitted==

a system includes a mask. the system further includes a pellicle frame attached to the mask. the pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from a first side of the pellicle from to a second side of the pellicle frame. the pellicle frame further includes a flat bottom surface having only a single recess therein, wherein the flat bottom surface is free of an adhesive. the system further includes a gasket within the single recess.



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