Taiwan semiconductor manufacturing company, ltd. (20240103358). SYSTEM AND STRUCTURE INCLUDING A PELLICLE simplified abstract
Contents
- 1 SYSTEM AND STRUCTURE INCLUDING A PELLICLE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SYSTEM AND STRUCTURE INCLUDING A PELLICLE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Hsin-Chang Lee of Hsinchu (TW)
SYSTEM AND STRUCTURE INCLUDING A PELLICLE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240103358 titled 'SYSTEM AND STRUCTURE INCLUDING A PELLICLE
Simplified Explanation
The patent application describes a system with a mask and a pellicle frame attached to the mask, including a check valve for gas flow. The pellicle frame has a flat bottom surface with a single recess, free of adhesive, containing a gasket.
- The system includes a mask and a pellicle frame attached to the mask.
- The pellicle frame has a check valve for gas flow from one side to the other.
- The flat bottom surface of the pellicle frame has a single recess with a gasket inside.
Potential Applications
This technology could be applied in the manufacturing of semiconductor devices, optical components, and other industries requiring contamination control in cleanroom environments.
Problems Solved
This technology solves the problem of preventing contamination on sensitive surfaces during manufacturing processes by providing a sealed environment with controlled gas flow.
Benefits
The benefits of this technology include improved product quality, increased yield rates, and reduced maintenance costs due to minimized contamination risks.
Potential Commercial Applications
"Contamination Control System for Cleanroom Environments" could be a suitable title for this section. The technology could be commercialized in the semiconductor industry, optics industry, and other high-tech manufacturing sectors.
Possible Prior Art
There may be prior art related to contamination control systems in cleanroom environments, but specific examples are not provided in the abstract.
Unanswered Questions
How does the check valve operate within the pellicle frame to control gas flow?
The abstract mentions a check valve for gas flow, but it does not elaborate on the mechanism or design of this valve within the pellicle frame.
What materials are used in the construction of the pellicle frame and gasket to ensure compatibility with cleanroom environments?
The abstract does not specify the materials used in the pellicle frame and gasket, which are crucial for maintaining cleanliness and preventing contamination in sensitive manufacturing processes.
Original Abstract Submitted
a system includes a mask. the system further includes a pellicle frame attached to the mask. the pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from a first side of the pellicle from to a second side of the pellicle frame. the pellicle frame further includes a flat bottom surface having only a single recess therein, wherein the flat bottom surface is free of an adhesive. the system further includes a gasket within the single recess.
