View source for Samsung electronics co., ltd. (20250014169). METHOD OF INSPECTING DEFECTS

=METHOD OF INSPECTING DEFECTS=


==Organization Name==

[[:Category:samsung electronics co., ltd.|samsung electronics co., ltd.]]


[[Category:samsung electronics co., ltd.]]

==Inventor(s)==

[[:Category:Bumjoo Lee of Suwon-si KR|Bumjoo Lee of Suwon-si KR]][[Category:Bumjoo Lee of Suwon-si KR]]

[[:Category:Jinwoo Lee of Suwon-si KR|Jinwoo Lee of Suwon-si KR]][[Category:Jinwoo Lee of Suwon-si KR]]

[[:Category:Suyoung Lee of Suwon-si KR|Suyoung Lee of Suwon-si KR]][[Category:Suyoung Lee of Suwon-si KR]]

==METHOD OF INSPECTING DEFECTS==


This abstract first appeared for US patent application 20250014169 titled 'METHOD OF INSPECTING DEFECTS

==Original Abstract Submitted==

a defect inspection method includes: recognizing image peaks that are reference positions of image patterns included an inspection image; performing filtering on a reference image including reference patterns, recognizing reference peaks, and then selecting some of the reference peaks as peak samples; calculating candidate correction constants by overlapping the filtered inspection image and the filtered reference image, and then selecting a primary correction constant among the candidate correction constants; applying the first correction constant to the reference image and selecting a secondary correction constant by matching the image peaks to the reference peaks included in a primary corrected reference image, and then applying the secondary correction constant to the primary corrected reference image and forming a secondary corrected reference image aligned with the inspection image; and performing a defect inspection on the inspection image by matching the image patterns to reference patterns included in the secondary corrected reference image.



[[Category:G06T7/00]]
[[Category:G06T5/20]]
[[Category:G06T5/70]]
[[Category:G06T7/11]]
[[Category:CPC_G06T7/001]]