Samsung electronics co., ltd. (20250014169). METHOD OF INSPECTING DEFECTS
METHOD OF INSPECTING DEFECTS
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METHOD OF INSPECTING DEFECTS
This abstract first appeared for US patent application 20250014169 titled 'METHOD OF INSPECTING DEFECTS
Original Abstract Submitted
a defect inspection method includes: recognizing image peaks that are reference positions of image patterns included an inspection image; performing filtering on a reference image including reference patterns, recognizing reference peaks, and then selecting some of the reference peaks as peak samples; calculating candidate correction constants by overlapping the filtered inspection image and the filtered reference image, and then selecting a primary correction constant among the candidate correction constants; applying the first correction constant to the reference image and selecting a secondary correction constant by matching the image peaks to the reference peaks included in a primary corrected reference image, and then applying the secondary correction constant to the primary corrected reference image and forming a secondary corrected reference image aligned with the inspection image; and performing a defect inspection on the inspection image by matching the image patterns to reference patterns included in the secondary corrected reference image.
