View source for Category:C23C14/34


* '''Section C''': Chemistry; Metallurgy
* '''Class C23''': Coating Metallic Material; Coating Material With Metallic Material
* '''Subclass C23C''': Coating Metallic Material
* '''Main Group C23C14/00''': Coating by vacuum evaporation, by sputtering, or by ion implantation of the coating forming material
* '''Subgroup C23C14/34''': Coating on selected surface areas, e.g., using masks


Classification "C23C14/34" relates to methods and processes in the field of chemistry and metallurgy, specifically focusing on coating metallic materials. This subgroup pertains to the techniques of vacuum evaporation, sputtering, or ion implantation for depositing coating material, with a particular emphasis on applying coatings to selected areas of a surface, often using masks. This technique is crucial in various industrial applications, including the manufacture of semiconductor devices, where precise and selective coating is essential for functionality. The use of masks in these processes allows for selective deposition, enabling intricate patterns and structures essential for modern electronic components and other advanced material applications.