View source for 20250230265. Brush Polymer Terminated Wit (Merck Patent)

= BRUSH POLYMER TERMINATED WITH PHOSPHONATE FOR DSA =

'''Abstract''':
the disclosed subject matter relates compounds of structure (i), and polymers of structure (ii) having a polydispersity ranging from 1 to about 1.1, compositions comprising said polymers and a spin casting solvent, the process of forming a pinning layer selectively on metal with said composition and the process of using said pinning layers to affect chemoepitaxy directed self-assembly of an overlying block copolymer, and the subsequent process of pattern transfer of this self-assembled layer into a substrate by etching.

'''Inventor(s)''': [[:Category:EunJeong JEONG of Gyeonggi-do  KR|EunJeong JEONG]], [[:Category:Durairaj BASKARAN of Bridgewater NJ US|Durairaj BASKARAN]], [[:Category:Jihoon KIM of North Wales PA US|Jihoon KIM]]

'''CPC Classification''': [[:Category:CPC_C08F4/6497|C08F4/6497]] (MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS)


[[Category:Patent Applications]]
[[Category:Merck Patent GmbH]]
[[Category:CPC_C08F4/6497]]
[[Category:EunJeong JEONG of Gyeonggi-do  KR]]
[[Category:Durairaj BASKARAN of Bridgewater NJ US]]
[[Category:Jihoon KIM of North Wales PA US]]

[https://wikipatents.org/index.php?search=20250230265+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250230265]


<!-- JSON-LD markup for search engines:
{"@context":"https://schema.org","@type":"TechArticle","headline":"20250230265. Brush Polymer Terminated Wit (Merck Patent)","name":"20250230265. Brush Polymer Terminated Wit (Merck Patent)","description":"Patent application abstract and classification for 20250230265 - Brush Polymer Terminated Wit","datePublished":"2025-07-21","mainEntity":{"@type":"GovernmentPermit","permitType":"Patent Application","identifier":"20250230265","name":"Brush Polymer Terminated Wit","additionalProperty":[{"@type":"PropertyValue","name":"Organization","value":"Merck Patent GmbH"}]}}
-->