View source for 20250215551. Methods Sy (Silanna UV Technologies)

= METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE =

'''Abstract''':
methods and systems of heating a substrate in a vacuum deposition process include a resistive heater having a resistive heating element. radiative heat emitted from the resistive heating element has a wavelength in a mid-infrared band from 5 �m to 40 �m that corresponds to a phonon absorption band of the substrate. the substrate comprises a wide bandgap semiconducting material and has an uncoated surface and a deposition surface opposite the uncoated surface. the resistive heater and the substrate are positioned in a vacuum deposition chamber. the uncoated surface of the substrate is spaced apart from and faces the resistive heater.

'''Inventor(s)''': [[:Category:Petar Atanackovic of Henley Beach South  AU|Petar Atanackovic]]

'''CPC Classification''': [[:Category:CPC_C23C14/541|C23C14/541]] (Controlling or regulating the coating process)


[[Category:Patent Applications]]
[[Category:Silanna UV Technologies Pte Ltd]]
[[Category:CPC_C23C14/541]]
[[Category:Petar Atanackovic of Henley Beach South  AU]]

[https://wikipatents.org/index.php?search=20250215551+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250215551]


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