METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE

Abstract: methods and systems of heating a substrate in a vacuum deposition process include a resistive heater having a resistive heating element. radiative heat emitted from the resistive heating element has a wavelength in a mid-infrared band from 5 �m to 40 �m that corresponds to a phonon absorption band of the substrate. the substrate comprises a wide bandgap semiconducting material and has an uncoated surface and a deposition surface opposite the uncoated surface. the resistive heater and the substrate are positioned in a vacuum deposition chamber. the uncoated surface of the substrate is spaced apart from and faces the resistive heater.

Inventor(s): Petar Atanackovic

CPC Classification: C23C14/541 (Controlling or regulating the coating process)

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