View source for 20250189903. Inspection Method, (TOKYO OHKA KOGYO ., .)

= INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETTING COMPOSITION, METHOD OF PRODUCING RESIN COMPOSITION, AND METHOD OF PRODUCING RESIST COMPOSITION OR THERMOSETTING COMPOSITION =

'''Abstract''':
an inspection method including a step v of filtering a precursor composition v containing a polymer compound and a solvent v, a step x1 of coating a substrate x with a resin composition x containing the precursor composition to form a coating film x, a step x2 of removing the coating film x from the substrate x using a removal solvent x including at least one selected from the group consisting of an organic solvent x, an alkali developing solution x, and water; and a step x3 of measuring the number of defects on the substrate x after the coating film x is removed, using a defect inspection device.

'''Inventor(s)''': [[:Category:Komei HIRAHARA of Kawasaki-shi  JP|Komei HIRAHARA]], [[:Category:Yoshihito KAI of Kawasaki-shi  JP|Yoshihito KAI]], [[:Category:Akihiko NAKATA of Kawasaki-shi  JP|Akihiko NAKATA]]

'''CPC Classification''': [[:Category:CPC_G03F7/7065|G03F7/7065]] (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;  (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))


[[Category:Patent Applications]]
[[Category:TOKYO OHKA KOGYO CO., LTD.]]
[[Category:CPC_G03F7/7065]]
[[Category:Komei HIRAHARA of Kawasaki-shi  JP]]
[[Category:Yoshihito KAI of Kawasaki-shi  JP]]
[[Category:Akihiko NAKATA of Kawasaki-shi  JP]]

[https://wikipatents.org/index.php?search=20250189903+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250189903]


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