INSPECTION METHOD, RESIN SOLUTION, RESIST COMPOSITION OR THERMOSETTING COMPOSITION, METHOD OF PRODUCING RESIN COMPOSITION, AND METHOD OF PRODUCING RESIST COMPOSITION OR THERMOSETTING COMPOSITION

Abstract: an inspection method including a step v of filtering a precursor composition v containing a polymer compound and a solvent v, a step x1 of coating a substrate x with a resin composition x containing the precursor composition to form a coating film x, a step x2 of removing the coating film x from the substrate x using a removal solvent x including at least one selected from the group consisting of an organic solvent x, an alkali developing solution x, and water; and a step x3 of measuring the number of defects on the substrate x after the coating film x is removed, using a defect inspection device.

Inventor(s): Komei HIRAHARA, Yoshihito KAI, Akihiko NAKATA

CPC Classification: G03F7/7065 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices ; photosensitive materials or processes for photographic purposes ; electrophotography, sensitive layers or processes therefor ))

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