View source for 20250172475. Imaging Device Imaging M (NIKON)

= IMAGING DEVICE AND IMAGING METHOD =

'''Abstract''':
an imaging device () includes a substrate (), a first optical system (), and an imaging part (). a subject () is disposed on the substrate (). the first optical system () irradiates the subject () with first emitted light (l). the imaging part () images an interference image between first reflected light (l) and second reflected light (l). the first reflected light (l) is the first emitted light (l) reflected at a first interface (f) conforming to an outer surface of the subject (). the second reflected light (l) is the first emitted light (l) reflected at a second interface (f) between the subject () and the substrate ().

'''Inventor(s)''': [[:Category:Masaki MORIYAMA of Kawasaki-shi  JP|Masaki MORIYAMA]], [[:Category:Naoya ISHIZAWA of Saitama-shi  JP|Naoya ISHIZAWA]], [[:Category:Ryo KOBAYASHI of Kawasaki-shi  JP|Ryo KOBAYASHI]], [[:Category:Makiko TAKUBO of Sagamihara-shi  JP|Makiko TAKUBO]], [[:Category:Seri HAYASHI of Tokyo  JP|Seri HAYASHI]], [[:Category:Shuhei TANAKA of Yokohama-shi  JP|Shuhei TANAKA]], [[:Category:Masataka MURAKAMI of Yokohama-shi  JP|Masataka MURAKAMI]], [[:Category:Tetsuro HOSHINO of Kawasaki-shi  JP|Tetsuro HOSHINO]], [[:Category:Akio IWASA of Yokohama-shi  JP|Akio IWASA]], [[:Category:Masafumi MIMURA of Ageo-shi  JP|Masafumi MIMURA]], [[:Category:Naoki FUKUTAKE of Tokyo  JP|Naoki FUKUTAKE]], [[:Category:Kiyoshi NOZAKI of Sagamihara-shi  JP|Kiyoshi NOZAKI]]

'''CPC Classification''': [[:Category:CPC_G01N15/0227|G01N15/0227]] (Investigating particle size or size distribution  (by measuring osmotic pressure ; investigating sedimentation of particle suspensions ; investigating individual particles ))


[[Category:Patent Applications]]
[[Category:NIKON CORPORATION]]
[[Category:CPC_G01N15/0227]]
[[Category:Masaki MORIYAMA of Kawasaki-shi  JP]]
[[Category:Naoya ISHIZAWA of Saitama-shi  JP]]
[[Category:Ryo KOBAYASHI of Kawasaki-shi  JP]]
[[Category:Makiko TAKUBO of Sagamihara-shi  JP]]
[[Category:Seri HAYASHI of Tokyo  JP]]
[[Category:Shuhei TANAKA of Yokohama-shi  JP]]
[[Category:Masataka MURAKAMI of Yokohama-shi  JP]]
[[Category:Tetsuro HOSHINO of Kawasaki-shi  JP]]
[[Category:Akio IWASA of Yokohama-shi  JP]]
[[Category:Masafumi MIMURA of Ageo-shi  JP]]
[[Category:Naoki FUKUTAKE of Tokyo  JP]]
[[Category:Kiyoshi NOZAKI of Sagamihara-shi  JP]]

[https://wikipatents.org/index.php?search=20250172475+rejection&title=Special%3ASearch&wprov=acrw1_-1 Search for rejections for patent application number 20250172475]


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