View source for 20240020821. DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND DEFECT INSPECTION COMPUTER PROGRAM PRODUCT simplified abstract (KABUSHIKI KAISHA TOSHIBA)

=DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND DEFECT INSPECTION COMPUTER PROGRAM PRODUCT=


==Organization Name==

[[:Category:KABUSHIKI KAISHA TOSHIBA|KABUSHIKI KAISHA TOSHIBA]]


[[Category:KABUSHIKI KAISHA TOSHIBA]]

==Inventor(s)==

[[:Category:Akira Moriya of Kawasaki Kanagawa (JP)|Akira Moriya of Kawasaki Kanagawa (JP)]][[Category:Akira Moriya of Kawasaki Kanagawa (JP)]]

==DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND DEFECT INSPECTION COMPUTER PROGRAM PRODUCT - A simplified explanation of the abstract==


This abstract first appeared for US patent application 20240020821 titled 'DEFECT INSPECTION DEVICE, DEFECT INSPECTION METHOD, AND DEFECT INSPECTION COMPUTER PROGRAM PRODUCT

==Simplified Explanation==

The patent application describes a defect inspection device that includes several units for acquiring and generating images, as well as controlling the defect estimation process. Here is a simplified explanation of the abstract:

* The acquisition unit captures an inspection image and a reference image of the inspection target.
* The evaluation-target-image-generation unit combines the reference and inspection images to generate an evaluation target image.
* The defect-estimation-image-generation unit generates a defect estimation image by assigning a defect estimation value to each pixel in a defect candidate area within the evaluation target image.
* The iteration-control unit controls the defect-estimation-image-generation unit to iterate the defect estimation image generation process using the defect estimation image as the new evaluation target image.

Potential Applications:
* Quality control in manufacturing processes: This defect inspection device can be used to identify and estimate defects in products during the manufacturing process, ensuring high-quality output.
* Semiconductor industry: The device can be applied to inspect and estimate defects in semiconductor wafers, improving the yield and reliability of electronic components.

Problems Solved:
* Efficient defect estimation: The device automates the process of defect estimation by generating an evaluation target image and iteratively refining the defect estimation image, reducing the time and effort required for manual inspection.
* Accurate defect identification: By analyzing consecutive pixels in the defect candidate area, the device can accurately identify and estimate defects, minimizing false positives and false negatives.

Benefits:
* Improved inspection efficiency: The automated defect estimation process speeds up the inspection process, allowing for faster production cycles and reduced costs.
* Enhanced product quality: By accurately identifying and estimating defects, the device helps manufacturers maintain high-quality standards and reduce the number of defective products reaching the market.
* Cost savings: The device eliminates the need for manual inspection, reducing labor costs and increasing productivity.




==Original Abstract Submitted==

according to one embodiment, a defect inspection device includes an acquisition unit, an evaluation-target-image-generation unit, a defect-estimation-image-generation unit, and an iteration-control unit. the acquisition unit acquires an inspection image obtained by imaging an inspection target and a reference image of the inspection target in design. the evaluation-target-image-generation unit generates an evaluation target image according to the reference and inspection images. the defect-estimation-image-generation unit generates a defect estimation image with a defect estimation value being defined for each pixel based on a feature of a defect candidate area corresponding to an image area of consecutive pixels each of which has a pixel value equal to or greater than a first threshold value and which are included in the evaluation target image. the iteration-control unit controls the defect-estimation-image-generation unit to iterate defect estimation image generation processing using the defect estimation image as the evaluation target image.



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