View source for 19018736. VIA RAIL STRUCTURE (Taiwan Semiconductor Manufacturing Company, Ltd.)

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=VIA RAIL STRUCTURE=


==Organization Name==

[[:Category:Taiwan Semiconductor Manufacturing Company, Ltd.|Taiwan Semiconductor Manufacturing Company, Ltd.]]


[[Category:Taiwan Semiconductor Manufacturing Company, Ltd.]]

==Inventor(s)==

[[:Category:Hao Kuang of Hsinchu TW|Hao Kuang of Hsinchu TW]][[Category:Hao Kuang of Hsinchu TW]]

[[:Category:Tung-Heng Hsieh of Hsinchu County TW|Tung-Heng Hsieh of Hsinchu County TW]][[Category:Tung-Heng Hsieh of Hsinchu County TW]]

[[:Category:Sheng-Hsiung Wang of Hsinchu County TW|Sheng-Hsiung Wang of Hsinchu County TW]][[Category:Sheng-Hsiung Wang of Hsinchu County TW]]

[[:Category:Bao-Ru Young of Hsinchu County TW|Bao-Ru Young of Hsinchu County TW]][[Category:Bao-Ru Young of Hsinchu County TW]]

[[:Category:Wang-Jung Hsueh of New Taipei City TW|Wang-Jung Hsueh of New Taipei City TW]][[Category:Wang-Jung Hsueh of New Taipei City TW]]

[[:Category:Pang-Chi Wu of Hsinchu TW|Pang-Chi Wu of Hsinchu TW]][[Category:Pang-Chi Wu of Hsinchu TW]]

==VIA RAIL STRUCTURE==


This abstract first appeared for US patent application 19018736 titled 'VIA RAIL STRUCTURE

==Original Abstract Submitted==

A device includes a semiconductor substrate, an active region over the semiconductor substrate extending lengthwise in a first direction, a gate structure over the active region extending lengthwise in a second direction perpendicular to the first direction, a source feature and a drain feature on the active region and interposed by the gate structure, a source contact on the source feature, a drain contact on the drain feature, and a via rail over the substrate spaced from the active region. The via rail includes a main portion extending lengthwise in the first direction having a sidewall surface facing opposite the end surface of the drain contact, and a jog via extending from the main portion along the second direction and having a sidewall surface facing the second direction, each of the main portion and the jog via contacting the source contact.



[[Category:H01L23/522]]
[[Category:G06F30/392]]
[[Category:G06F30/3953]]
[[Category:G06F30/398]]
[[Category:CPC_H01L23/5226]]