View source for 18982902. CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD (ASML Netherlands B.V.)

=CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD=


==Organization Name==

[[:Category:ASML Netherlands B.V.|ASML Netherlands B.V.]]


[[Category:ASML Netherlands B.V.]]

==Inventor(s)==

[[:Category:Marco Jan-Jaco Wieland of Delft NL|Marco Jan-Jaco Wieland of Delft NL]][[Category:Marco Jan-Jaco Wieland of Delft NL]]

[[:Category:Vincent Sylvester Kuiper of Monster NL|Vincent Sylvester Kuiper of Monster NL]][[Category:Vincent Sylvester Kuiper of Monster NL]]

[[:Category:Anagnostis Tsiatmas of San Jose CA US|Anagnostis Tsiatmas of San Jose CA US]][[Category:Anagnostis Tsiatmas of San Jose CA US]]

==CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD==


This abstract first appeared for US patent application 18982902 titled 'CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD

==Original Abstract Submitted==

An assessment method comprising: using an assessment apparatus to generate assessment signals representing a property of a surface of a sample; processing the assessment signals to identify candidate defects and outputting a candidate defect signal; monitoring the status of the assessment apparatus for error conditions and generating a status signal indicating any error conditions during functioning of the assessment apparatus; and analysing the candidate defect signal to determine if the candidate defects are real defects; wherein analysis of a candidate defect is not completed if the status signal indicates that the assessment signal(s) and/or the candidate defect signal corresponding to the candidate defect would have been affected by an error condition.



[[Category:H01J37/22]]
[[Category:H01J37/26]]
[[Category:H01J37/28]]
[[Category:CPC_H01J37/222]]