View source for 18962380. SHOWERHEAD FOR PROCESS TOOL (Tokyo Electron Limited)

=SHOWERHEAD FOR PROCESS TOOL=


==Organization Name==

[[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]


[[Category:Tokyo Electron Limited]]

==Inventor(s)==

[[:Category:Anthony Dip of Cedar Creek TX US|Anthony Dip of Cedar Creek TX US]][[Category:Anthony Dip of Cedar Creek TX US]]

==SHOWERHEAD FOR PROCESS TOOL==


This abstract first appeared for US patent application 18962380 titled 'SHOWERHEAD FOR PROCESS TOOL

==Original Abstract Submitted==

In one example, an apparatus includes a processing chamber; a substrate holder disposed in the processing chamber; and a showerhead disposed over the substrate holder. The showerhead includes a first zone disposed in a central region of the showerhead, the first zone including a first cavity, a plurality of first fluid exit holes aligned to output a fluid from the first cavity towards the substrate holder, a first flow path fluidly coupled to a fluid source, and a plurality of first fluid distribution pathways fluidly coupling the first flow path with the first cavity.



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[[Category:C23C16/458]]
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[[Category:CPC_C23C16/45565]]