View source for 18944529. PROCESSING APPARATUS AND PROCESSING METHOD (Tokyo Electron Limited)

=PROCESSING APPARATUS AND PROCESSING METHOD=


==Organization Name==

[[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]


[[Category:Tokyo Electron Limited]]

==Inventor(s)==

[[:Category:Hiroki Iriuda of Yamanashi (JP)|Hiroki Iriuda of Yamanashi (JP)]][[Category:Hiroki Iriuda of Yamanashi (JP)]]

[[:Category:Yoichiro Chiba of Iwate (JP)|Yoichiro Chiba of Iwate (JP)]][[Category:Yoichiro Chiba of Iwate (JP)]]

[[:Category:Atsushi Endo of Yamanashi (JP)|Atsushi Endo of Yamanashi (JP)]][[Category:Atsushi Endo of Yamanashi (JP)]]

==PROCESSING APPARATUS AND PROCESSING METHOD==


This abstract first appeared for US patent application 18944529 titled 'PROCESSING APPARATUS AND PROCESSING METHOD

==Original Abstract Submitted==

A processing apparatus includes: a processing container having a substantially cylindrical shape and provided with an exhaust slit on a side wall; and a first pair of gas nozzles extending in a vertical direction along an inside of the side wall of the processing container and disposed symmetrically with respect to a straight line extending from a center of the exhaust slit to a portion of the side wall positioned opposite to the exhaust slit via a center of the processing container; a second pair of gas nozzle disposed symmetrically with respect to the straight line; at least one memory storing executable instructions; and at least one processor configured to execute the executable instructions to: control the first pair of gas nozzles and the second pair of gas nozzles to eject a same processing gas into the processing container.



[[Category:C23C16/455]]
[[Category:C23C16/52]]
[[Category:CPC_C23C16/45563]]