View source for 18799065. MEASUREMENT DEVICE AND MEASUREMENT METHOD (Kioxia Corporation)

=MEASUREMENT DEVICE AND MEASUREMENT METHOD=


==Organization Name==

[[:Category:Kioxia Corporation|Kioxia Corporation]]


[[Category:Kioxia Corporation]]

==Inventor(s)==

[[:Category:Shutaro Otsuka of Yokohama (JP)|Shutaro Otsuka of Yokohama (JP)]][[Category:Shutaro Otsuka of Yokohama (JP)]]

[[:Category:Takuji Ohashi of Yokohama (JP)|Takuji Ohashi of Yokohama (JP)]][[Category:Takuji Ohashi of Yokohama (JP)]]

[[:Category:Kazuyuki Masukawa of Yokohama (JP)|Kazuyuki Masukawa of Yokohama (JP)]][[Category:Kazuyuki Masukawa of Yokohama (JP)]]

[[:Category:Takaki Hashimoto of Yokohama (JP)|Takaki Hashimoto of Yokohama (JP)]][[Category:Takaki Hashimoto of Yokohama (JP)]]

==MEASUREMENT DEVICE AND MEASUREMENT METHOD==


This abstract first appeared for US patent application 18799065 titled 'MEASUREMENT DEVICE AND MEASUREMENT METHOD

==Original Abstract Submitted==

A measurement device includes a first light source configured to generate first light; a first beam splitter configured to split the first light into second light and third light; and a detector configured to receive signal light generated from a subject through irradiating the subject with the second light and the third light. The first light has a wavelength transmittable through a substrate. The second light is vertically incident on a surface of a first film formed on the subject. The third light is vertically incident on a rear surface of the substrate to be coaxial with the second light. A phase of transmitted light through the substrate is opposite to a phase of reflected light. An intensity of the transmitted light is equal to an intensity of the reflected light.



[[Category:G01B11/06]]
[[Category:CPC_G01B11/0625]]