View source for 18231339. YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

=YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME=


==Organization Name==

[[:Category:Samsung Electronics Co., Ltd.|Samsung Electronics Co., Ltd.]]


[[Category:Samsung Electronics Co., Ltd.]]

==Inventor(s)==

[[:Category:Hyunwoo Kim of Suwon-si (KR)|Hyunwoo Kim of Suwon-si (KR)]][[Category:Hyunwoo Kim of Suwon-si (KR)]]

[[:Category:Kazuki Harano of Tokyo (JP)|Kazuki Harano of Tokyo (JP)]][[Category:Kazuki Harano of Tokyo (JP)]]

[[:Category:Kiyoshi Murata of Tokyo (JP)|Kiyoshi Murata of Tokyo (JP)]][[Category:Kiyoshi Murata of Tokyo (JP)]]

[[:Category:Haruyoshi Sato of Tokyo (JP)|Haruyoshi Sato of Tokyo (JP)]][[Category:Haruyoshi Sato of Tokyo (JP)]]

[[:Category:Seungmin Ryu of Suwon-si (KR)|Seungmin Ryu of Suwon-si (KR)]][[Category:Seungmin Ryu of Suwon-si (KR)]]

[[:Category:Gyuhee Park of Suwon-si (KR)|Gyuhee Park of Suwon-si (KR)]][[Category:Gyuhee Park of Suwon-si (KR)]]

[[:Category:Younjoung Cho of Suwon-si (KR)|Younjoung Cho of Suwon-si (KR)]][[Category:Younjoung Cho of Suwon-si (KR)]]

[[:Category:Atsushi Yamashita of Tokyo (KR)|Atsushi Yamashita of Tokyo (KR)]][[Category:Atsushi Yamashita of Tokyo (KR)]]

==YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18231339 titled 'YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FILM, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

==Simplified Explanation==

The abstract describes a yttrium compound, a method of manufacturing an integrated circuit device, and a raw material for forming an yttrium-containing film.

* Yttrium compound represented by General formula (1) is disclosed.
* Method for manufacturing an integrated circuit device is provided.
* Raw material for forming an yttrium-containing film is described.

== Potential Applications ==
* Semiconductor industry for manufacturing integrated circuit devices.
* Electronics industry for forming yttrium-containing films in various electronic components.

== Problems Solved ==
* Providing a novel yttrium compound for use in manufacturing processes.
* Offering a method for forming yttrium-containing films in electronic devices.

== Benefits ==
* Improved performance and efficiency of integrated circuit devices.
* Enhanced properties of electronic components with yttrium-containing films.


==Original Abstract Submitted==

An yttrium compound, a method of manufacturing an integrated circuit device, and a raw material for forming an yttrium-containing film, the yttrium compound being represented by the following General formula (1):



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