View source for 17984500. SUBSTRATE PROCESSING APPARATUS simplified abstract (Samsung Display Co., Ltd.)

=SUBSTRATE PROCESSING APPARATUS=


==Organization Name==

[[:Category:Samsung Display Co., Ltd.|Samsung Display Co., Ltd.]]


[[Category:Samsung Display Co., Ltd.]]

==Inventor(s)==

[[:Category:Choelmin Jang of Seoul (KR)|Choelmin Jang of Seoul (KR)]][[Category:Choelmin Jang of Seoul (KR)]]

[[:Category:Junggon Kim of Hwaseong-si (KR)|Junggon Kim of Hwaseong-si (KR)]][[Category:Junggon Kim of Hwaseong-si (KR)]]

[[:Category:Min-Gyu Park of Cheonan-si (KR)|Min-Gyu Park of Cheonan-si (KR)]][[Category:Min-Gyu Park of Cheonan-si (KR)]]

[[:Category:Heeyong Lee of Seongnam-si (KR)|Heeyong Lee of Seongnam-si (KR)]][[Category:Heeyong Lee of Seongnam-si (KR)]]

[[:Category:Eun Jung of Uiwang-si (KR)|Eun Jung of Uiwang-si (KR)]][[Category:Eun Jung of Uiwang-si (KR)]]

[[:Category:Myungsoo Huh of Suwon-si (KR)|Myungsoo Huh of Suwon-si (KR)]][[Category:Myungsoo Huh of Suwon-si (KR)]]

==SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17984500 titled 'SUBSTRATE PROCESSING APPARATUS

==Simplified Explanation==

The abstract describes a substrate processing apparatus that includes a chamber, a nozzle assembly, and a lifting module. The chamber maintains a vacuum state and has an upper wall positioned on the working space. The nozzle assembly is positioned in the working space and includes nozzles. The lifting module includes a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.

* The substrate processing apparatus includes a chamber with a vacuum state and an upper wall.
* A nozzle assembly with nozzles is positioned in the working space of the chamber.
* A lifting module outside the chamber includes a frame and a lifting part that lifts the frame.
* At least one shaft passes through the upper wall and connects the frame and the nozzle assembly.
* The shaft extends in the direction of gravity.

==Potential Applications==
* Semiconductor manufacturing: The substrate processing apparatus can be used in the production of semiconductors.
* Thin film deposition: The apparatus can be utilized for depositing thin films on various substrates.
* Surface treatment: It can be employed for surface treatment processes such as cleaning or etching.

==Problems Solved==
* Maintaining a vacuum state: The chamber of the apparatus ensures a vacuum environment for effective substrate processing.
* Precise positioning: The lifting module allows accurate positioning of the nozzle assembly for optimal substrate treatment.
* Efficient substrate processing: The apparatus enables efficient and controlled processing of substrates.

==Benefits==
* Improved productivity: The apparatus allows for faster and more efficient substrate processing, leading to increased productivity.
* Enhanced precision: The lifting module enables precise positioning of the nozzle assembly, resulting in improved accuracy and quality of substrate treatment.
* Versatility: The substrate processing apparatus can be utilized in various applications within the semiconductor industry and other fields requiring substrate processing.


==Original Abstract Submitted==

A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.



[[Category:B05C11/10]]
[[Category:B05C5/02]]
[[Category:B05C15/00]]
[[Category:B05B15/65]]
[[Category:B05B15/70]]
[[Category:B05B15/62]]