17984500. SUBSTRATE PROCESSING APPARATUS simplified abstract (Samsung Display Co., Ltd.)

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SUBSTRATE PROCESSING APPARATUS

Organization Name

Samsung Display Co., Ltd.

Inventor(s)

Choelmin Jang of Seoul (KR)

Junggon Kim of Hwaseong-si (KR)

Min-Gyu Park of Cheonan-si (KR)

Heeyong Lee of Seongnam-si (KR)

Eun Jung of Uiwang-si (KR)

Myungsoo Huh of Suwon-si (KR)

SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17984500 titled 'SUBSTRATE PROCESSING APPARATUS

Simplified Explanation

The abstract describes a substrate processing apparatus that includes a chamber, a nozzle assembly, and a lifting module. The chamber maintains a vacuum state and has an upper wall positioned on the working space. The nozzle assembly is positioned in the working space and includes nozzles. The lifting module includes a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.

  • The substrate processing apparatus includes a chamber with a vacuum state and an upper wall.
  • A nozzle assembly with nozzles is positioned in the working space of the chamber.
  • A lifting module outside the chamber includes a frame and a lifting part that lifts the frame.
  • At least one shaft passes through the upper wall and connects the frame and the nozzle assembly.
  • The shaft extends in the direction of gravity.

Potential Applications

  • Semiconductor manufacturing: The substrate processing apparatus can be used in the production of semiconductors.
  • Thin film deposition: The apparatus can be utilized for depositing thin films on various substrates.
  • Surface treatment: It can be employed for surface treatment processes such as cleaning or etching.

Problems Solved

  • Maintaining a vacuum state: The chamber of the apparatus ensures a vacuum environment for effective substrate processing.
  • Precise positioning: The lifting module allows accurate positioning of the nozzle assembly for optimal substrate treatment.
  • Efficient substrate processing: The apparatus enables efficient and controlled processing of substrates.

Benefits

  • Improved productivity: The apparatus allows for faster and more efficient substrate processing, leading to increased productivity.
  • Enhanced precision: The lifting module enables precise positioning of the nozzle assembly, resulting in improved accuracy and quality of substrate treatment.
  • Versatility: The substrate processing apparatus can be utilized in various applications within the semiconductor industry and other fields requiring substrate processing.


Original Abstract Submitted

A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.

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