View source for 17951580. MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Somin Cheon of Hwaseong-si (KR)|Somin Cheon of Hwaseong-si (KR)]][[Category:Somin Cheon of Hwaseong-si (KR)]]

[[:Category:Joonsung Kim of Hwaseong-si (KR)|Joonsung Kim of Hwaseong-si (KR)]][[Category:Joonsung Kim of Hwaseong-si (KR)]]

[[:Category:Jaewan Song of Hwaseong-si (KR)|Jaewan Song of Hwaseong-si (KR)]][[Category:Jaewan Song of Hwaseong-si (KR)]]

[[:Category:Seunghune Yang of Seoul (KR)|Seunghune Yang of Seoul (KR)]][[Category:Seunghune Yang of Seoul (KR)]]

[[:Category:Sooyong Lee of Yongin-si (KR)|Sooyong Lee of Yongin-si (KR)]][[Category:Sooyong Lee of Yongin-si (KR)]]

==MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17951580 titled 'MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS

==Simplified Explanation==

The patent application describes a method for designing a crack-resistant mask layout in a full-chip scale. This method includes designing a layout for the mask, extracting a representative pattern, detecting stress weak points in the pattern, verifying them by forming a pattern on a wafer, and making changes to the design rule for the full-chip layout.

* Method for designing a crack-resistant mask layout in a full-chip scale
* Designing a layout for the mask
* Extracting a representative pattern from the layout
* Detecting stress weak points in the pattern
* Verifying the weak points by forming a pattern on a wafer
* Changing the design rule for the full-chip layout

==Potential Applications==
* Semiconductor manufacturing
* Integrated circuit design
* Mask layout design

==Problems Solved==
* Cracks in mask layouts
* Weak points in patterns
* Inefficient design methods

==Benefits==
* Quick and effective mask layout design
* Improved crack resistance
* Enhanced manufacturing process


==Original Abstract Submitted==

A mask layout design method capable of quickly and effectively designing a crack-resistant mask layout in a full-chip scale, a mask manufacturing method including the mask layout design method, and a mask layout are provided. The mask layout design method includes designing a full-chip layout with respect to a mask; extracting a representative pattern from the full-chip layout; detecting a stress weak point in the representative pattern; verifying the stress weak point by forming a pattern on a wafer; and changing a design rule with respect to the full-chip layout.



[[Category:G06F30/3323]]
[[Category:G03F7/20]]