View source for 17820911. METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Sangchul Yeo of Osan-si (KR)|Sangchul Yeo of Osan-si (KR)]][[Category:Sangchul Yeo of Osan-si (KR)]]

[[:Category:Jaewon Yang of Suwon-si (KR)|Jaewon Yang of Suwon-si (KR)]][[Category:Jaewon Yang of Suwon-si (KR)]]

[[:Category:Hyeok Lee of Suwon-si (KR)|Hyeok Lee of Suwon-si (KR)]][[Category:Hyeok Lee of Suwon-si (KR)]]

[[:Category:Sooryong Lee of Seoul (KR)|Sooryong Lee of Seoul (KR)]][[Category:Sooryong Lee of Seoul (KR)]]

==METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17820911 titled 'METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR

==Simplified Explanation==

The abstract describes a method for training a semiconductor process image generator using a combination of mask images and their transformed versions. 

* The method involves training the generator with a first group of mask images and a second group of mask images.
* The generator is then trained with the second group of mask images and a first transformed group obtained by applying a transformation to the first group.
* Finally, the generator is trained with the first group of mask images and a second transformed group obtained by applying a transformation to the second group.

Potential Applications:

* This method can be used in the semiconductor industry for training image generators that simulate semiconductor processes.
* It can be applied in the development and optimization of semiconductor manufacturing processes.
* The generated images can be used for testing and validation of semiconductor process models and algorithms.

Problems Solved:

* Traditional methods of training semiconductor process image generators may not capture the full range of variations in mask images.
* This method addresses the limitation by incorporating transformed versions of the mask images, allowing for a more comprehensive training process.
* It helps in improving the accuracy and reliability of the generated images for various semiconductor process simulations.

Benefits:

* By training the generator with a combination of mask images and their transformed versions, the accuracy and diversity of the generated images can be enhanced.
* The method provides a more comprehensive training process, capturing a wider range of variations in mask images.
* The generated images can be used for various applications in the semiconductor industry, including process development, optimization, and testing.


==Original Abstract Submitted==

A method of training a semiconductor process image generator includes training the semiconductor process image generator with a plurality of mask images including a first group and a second group, training the semiconductor process image generator with the second group and a first transformed group obtained by applying a transformation to the first group, and training the semiconductor process image generator with the first group and a second transformed group obtained by applying a transformation to the second group.



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