17820911. METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR
Organization Name
Inventor(s)
METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 17820911 titled 'METHOD OF TRAINING SEMICONDUCTOR PROCESS IMAGE GENERATOR
Simplified Explanation
The abstract describes a method for training a semiconductor process image generator using a combination of mask images and their transformed versions.
- The method involves training the generator with a first group of mask images and a second group of mask images.
- The generator is then trained with the second group of mask images and a first transformed group obtained by applying a transformation to the first group.
- Finally, the generator is trained with the first group of mask images and a second transformed group obtained by applying a transformation to the second group.
Potential Applications:
- This method can be used in the semiconductor industry for training image generators that simulate semiconductor processes.
- It can be applied in the development and optimization of semiconductor manufacturing processes.
- The generated images can be used for testing and validation of semiconductor process models and algorithms.
Problems Solved:
- Traditional methods of training semiconductor process image generators may not capture the full range of variations in mask images.
- This method addresses the limitation by incorporating transformed versions of the mask images, allowing for a more comprehensive training process.
- It helps in improving the accuracy and reliability of the generated images for various semiconductor process simulations.
Benefits:
- By training the generator with a combination of mask images and their transformed versions, the accuracy and diversity of the generated images can be enhanced.
- The method provides a more comprehensive training process, capturing a wider range of variations in mask images.
- The generated images can be used for various applications in the semiconductor industry, including process development, optimization, and testing.
Original Abstract Submitted
A method of training a semiconductor process image generator includes training the semiconductor process image generator with a plurality of mask images including a first group and a second group, training the semiconductor process image generator with the second group and a first transformed group obtained by applying a transformation to the first group, and training the semiconductor process image generator with the first group and a second transformed group obtained by applying a transformation to the second group.
