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Category:H01L21/32
Pages in category "H01L21/32"
The following 27 pages are in this category, out of 27 total.
1
- 18330729. OPTICAL PROXIMITY CORRECTION METHOD AND PHOTOMASK FABRICATION METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18507019. APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS simplified abstract (Micron Technology, Inc.)
- 18637874. SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18653815. GATE ALIGNED CONTACT AND METHOD TO FABRICATE SAME simplified abstract (Intel Corporation)
- 18663364. Methods of Forming Material Within Openings Extending into a Semiconductor Construction, and Semiconductor Constructions Having Fluorocarbon Material simplified abstract (Micron Technology, Inc.)
- 18668042. MULTI-HEIGHT & MULTI-WIDTH INTERCONNECT LINE METALLIZATION FOR INTEGRATED CIRCUIT STRUCTURES simplified abstract (Intel Corporation)
I
- Intel corporation (20240282633). GATE ALIGNED CONTACT AND METHOD TO FABRICATE SAME simplified abstract
- Intel corporation (20240304549). MULTI-HEIGHT & MULTI-WIDTH INTERCONNECT LINE METALLIZATION FOR INTEGRATED CIRCUIT STRUCTURES simplified abstract
- Intel Corporation patent applications on August 22nd, 2024
- Intel Corporation patent applications on September 12th, 2024
M
- Micron technology, inc. (20240194529). APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS simplified abstract
- Micron technology, inc. (20240297068). Methods of Forming Material Within Openings Extending into a Semiconductor Construction, and Semiconductor Constructions Having Fluorocarbon Material simplified abstract
- Micron Technology, Inc. patent applications on February 6th, 2025
- Micron Technology, Inc. patent applications on June 13th, 2024
- Micron Technology, Inc. patent applications on September 5th, 2024
S
- Samsung electronics co., ltd. (20240176227). OPTICAL PROXIMITY CORRECTION METHOD AND PHOTOMASK FABRICATION METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240355637). METHOD FOR FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
T
- Taiwan semiconductor manufacturing company, ltd. (20240266439). SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND METHOD FOR FORMING THE SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379505). Bond Films for Reduced Thermal Resistance and Methods Forming the Same simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
U
- US Patent Application 18167024. SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE simplified abstract
- US Patent Application 18248900. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract
- US Patent Application 18351149. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract
