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Category:H01L21/033
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Pages in category "H01L21/033"
The following 200 pages are in this category, out of 281 total.
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- 17674575. Photoresist and Method simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 17686184. Patterned Semiconductor Device and Method simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 17697019. METHOD OF FORMING A PATTERN simplified abstract (Samsung Electronics Co., Ltd.)
- 17742667. COMPOUND FOR FORMING HARDMASK, HARDMASK COMPOSITION INCLUDING THE COMPOUND, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE HARDMASK COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17836820. METHOD FOR FABRICATING MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.)
- 17839809. METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS simplified abstract (Applied Materials, Inc.)
- 17896726. SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 17969558. METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PATTERNING (SADP) simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17985138. MANDREL-PULL-FIRST INTERCONNECT PATTERNING simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18054348. TRENCH ETCHING PROCESS FOR PHOTORESIST LINE ROUGHNESS IMPROVEMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18059398. SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THEREOF simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18064352. INTEGRATED CIRCUIT (IC) DEVICE WITH MULTI-PITCH PATTERN FABRICATED THROUGH CROSS-LINKABLE BLOCK COPOLYMER simplified abstract (Intel Corporation)
- 18070030. Method of Conductive Material Deposition simplified abstract (Tokyo Electron Limited)
- 18077658. CHEMICAL MECHANICAL POLISHING OF CARBON HARD MASK simplified abstract (Intel Corporation)
- 18090436. METHODS FOR FORMING SEMICONDUCTOR DEVICES USING MODIFIED PHOTOMASK LAYER simplified abstract (Tokyo Electron Limited)
- 18098999. FIELD-EFFECT TRANSISTORS FORMED USING A WIDE BANDGAP SEMICONDUCTOR MATERIAL simplified abstract (GlobalFoundries U.S. Inc.)
- 18099357. SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18143296. METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18147636. ION BEAM LITHOGRAPHY AND NANOENGINEERING simplified abstract (Intel Corporation)
- 18155955. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18156123. Reduction of Line Wiggling simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18158916. METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES simplified abstract (Applied Materials, Inc.)
- 18177353. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18190763. FACTORY SYSTEM AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18203163. METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18216485. AND DOUBLE PATTERNING STRATEGY WITH PRINTED ERASABLE DUMMIFICATION (Intel Corporation)
- 18223168. METHOD OF MANUFACTURING MEMORY DEVICE USING SELF-ALIGNED DOUBLE PATTERNING (SADP) simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18238015. METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE (NANYA TECHNOLOGY CORPORATION)
- 18244376. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18252032. METHOD FOR SELECTIVELY ETCHING A METAL COMPONENT simplified abstract (Microsoft Technology Licensing, LLC)
- 18296503. MULTI LEVEL CONTACT ETCH simplified abstract (Tokyo Electron Limited)
- 18298114. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18333000. MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE simplified abstract (SK hynix Inc.)
- 18356322. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18367292. GATE CUT AND FIN TRIM ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract (Intel Corporation)
- 18369148. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE (NANYA TECHNOLOGY CORPORATION)
- 18372212. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18379102. DESIGN, CONTROL, AND OPTIMIZATION OF PHOTOSENSITIVITY MODULATION ALONG PHOTORESIST FILM DEPTH simplified abstract (Applied Materials, Inc.)
- 18395715. PHOTOMASK STRUCTURE AND PATTERNING METHOD simplified abstract (Winbond Electronics Corp.)
- 18395788. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18401800. METHOD FOR FORMING AND USING MASK simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18407536. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18409031. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18410031. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18416087. SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS simplified abstract (Tokyo Electron Limited)
- 18416508. TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract (Intel Corporation)
- 18419696. Semiconductor Devices and Methods of Manufacturing simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18432694. SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18433251. METHOD OF FABRICATING SEMICONDUCTOR DEVICE WITH REDUCED TRENCH DISTORTIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18434121. Semiconductor Patterning and Resulting Structures simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18435294. MULTIPLE-STACK THREE-DIMENSIONAL MEMORY DEVICE AND FABRICATION METHOD THEREOF simplified abstract (Yangtze Memory Technologies Co., Ltd.)
- 18435609. DUAL METAL SILICIDE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract (Intel Corporation)
- 18444356. SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTOR FINS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18469743. HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18474849. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18502183. Sacrificial Layer for Semiconductor Process simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18505485. Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18507019. APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS simplified abstract (Micron Technology, Inc.)
- 18511023. METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE (NANYA TECHNOLOGY CORPORATION)
- 18511102. ENLARGING CONTACT AREA AND PROCESS WINDOW FOR A CONTACT VIA simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18516719. LINE-END EXTENSION METHOD AND DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18519263. INTEGRATED CIRCUITS WITH GATE CUT FEATURES simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18524767. FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING simplified abstract (TOKYO ELECTRON LIMITED)
- 18527024. PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18533635. METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18543432. METHOD AND STRUCTURE OF CUT END WITH SELF-ALIGNED DOUBLE PATTERNING simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18587218. EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE (SK hynix Inc.)
- 18595554. SEMICONDUCTOR DEVICE AND METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18597065. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18602665. VIA FOR SEMICONDUCTOR DEVICE CONNECTION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18606791. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18608191. Pitch Reduction Technology Using Alternating Spacer Depositions During the Formation of a Semiconductor Device and Systems Including Same simplified abstract (Lodestar Licensing Group LLC)
- 18608394. THREE-DIMENSIONAL MEMORY DEVICES AND FABRICATING METHODS THEREOF simplified abstract (YANGTZE MEMORY TECHNOLOGIES CO., LTD.)
- 18626719. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18638343. Methods of Forming Semiconductor Devices simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18638436. SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18639575. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18649541. SEMICONDUCTOR DEVICE STRUCTURE HAVING AIR GAP simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18660980. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18676056. Integrated Assemblies and Methods of Forming Integrated Assemblies simplified abstract (Micron Technology, Inc.)
- 18710946. SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID OR METAL (Lam Research Corporation)
- 18731454. TRENCH GATE HIGH VOLTAGE TRANSISTOR FOR EMBEDDED MEMORY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18751858. PELLICLE ASSEMBLY AND METHOD OF MAKING SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18817646. METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-CONTAINING PRECURSORS (Applied Materials, Inc.)
- 18882906. SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD (SEMES CO., LTD.)
- 18940382. HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION (Intel Corporation)
- 18940439. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18957283. TIN OXIDE MANDRELS IN PATTERNING (Lam Research Corporation)
- 18957867. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (SK hynix Inc.)
- 18959832. METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18966174. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- 18970265. PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION (Intel Corporation)
2
A
- Advanced micro devices, inc. (20250006496). REMOVING CONDUCTIVE MATERIAL FROM A PEDESTAL OF A SEMICONDUCTOR LID OUTSIDE OF AN AREA CONTACTING A DIE
- Advanced Micro Devices, Inc. patent applications on January 2nd, 2025
- Applied materials, inc. (20240249936). METHODS FOR REDUCING MICRO AND MACRO SCALLOPING ON SEMICONDUCTOR DEVICES simplified abstract
- Applied materials, inc. (20240266171). BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS simplified abstract
- Applied materials, inc. (20240266185). SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS simplified abstract
- Applied materials, inc. (20250095990). METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-CONTAINING PRECURSORS
- Applied Materials, Inc. patent applications on August 8th, 2024
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on March 20th, 2025
B
I
- Intel corporation (20240105520). TRENCH PLUG HARDMASK FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel corporation (20240162332). TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel corporation (20240178071). DUAL METAL SILICIDE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel corporation (20240186403). DUAL METAL GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel corporation (20240194483). INTEGRATED CIRCUIT (IC) DEVICE WITH MULTI-PITCH PATTERN FABRICATED THROUGH CROSS-LINKABLE BLOCK COPOLYMER simplified abstract
- Intel corporation (20240194732). CHEMICAL MECHANICAL POLISHING OF CARBON HARD MASK simplified abstract
- Intel corporation (20240222073). ION BEAM LITHOGRAPHY AND NANOENGINEERING simplified abstract
- Intel corporation (20240272547). TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATED METHODS simplified abstract
- Intel corporation (20240332290). TRANSISTOR WITH CHANNEL-SYMMETRIC GATE simplified abstract
- Intel corporation (20240332399). GATE CUT AND FIN TRIM ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION simplified abstract
- Intel corporation (20250006495). AND DOUBLE PATTERNING STRATEGY WITH PRINTED ERASABLE DUMMIFICATION
- Intel corporation (20250022939). CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
- Intel corporation (20250072078). HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
- Intel corporation (20250098258). PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
- Intel Corporation patent applications on August 15th, 2024
- Intel Corporation patent applications on February 13th, 2025
- Intel Corporation patent applications on February 27th, 2025
- INTEL CORPORATION patent applications on February 8th, 2024
- Intel Corporation patent applications on January 16th, 2025
- Intel Corporation patent applications on January 2nd, 2025
- Intel Corporation patent applications on July 4th, 2024
- Intel Corporation patent applications on June 13th, 2024
- Intel Corporation patent applications on June 6th, 2024
- Intel Corporation patent applications on March 20th, 2025
- Intel Corporation patent applications on March 28th, 2024
- Intel Corporation patent applications on May 16th, 2024
- Intel Corporation patent applications on May 30th, 2024
- Intel Corporation patent applications on October 3rd, 2024
- International business machines corporation (20240162087). MANDREL-PULL-FIRST INTERCONNECT PATTERNING simplified abstract
- INTERNATIONAL BUSINESS MACHINES CORPORATION patent applications on February 1st, 2024
- INTERNATIONAL BUSINESS MACHINES CORPORATION patent applications on May 16th, 2024
K
M
- Micron technology, inc. (20240194529). APPARATUS WITH SELF-ALIGNED CONNECTION AND RELATED METHODS simplified abstract
- Micron technology, inc. (20240315018). Integrated Assemblies and Methods of Forming Integrated Assemblies simplified abstract
- Micron Technology, Inc. patent applications on June 13th, 2024
- Micron Technology, Inc. patent applications on September 19th, 2024
S
- Samsung electronics co., ltd. (20240112915). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240118627). METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240120199). METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240128082). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240194521). METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240222123). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240231219). HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240297051). METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240313066). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240355637). METHOD FOR FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240429065). METHOD OF PATTERNING ELEMENTAL METALS
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on April 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on April 4th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 26th, 2024
- Samsung Electronics Co., Ltd. patent applications on February 6th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 13th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 13th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 19th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 19th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 5th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 5th, 2024
- Sk hynix inc. (20240304454). MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE simplified abstract
- Sk hynix inc. (20250085637). EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
- Sk hynix inc. (20250087488). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- SK hynix Inc. patent applications on March 13th, 2025
- SK hynix Inc. patent applications on September 12th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240096628). PHOTO MASK AND LITHOGRAPHY METHOD USING THE SAME simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240128126). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVCE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240162059). Semiconductor Devices and Methods of Manufacturing simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240194675). SEMICONDUCTOR DEVICE WITH HELMET STRUCTURE BETWEEN TWO SEMICONDUCTOR FINS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240222120). FACTORY SYSTEM AND METHOD FOR FORMING SEMICONDUCTOR STRUCTURE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240222121). METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240222134). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240249941). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240249942). SEMICONDUCTOR DEVICE AND METHOD simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240250020). VIA FOR SEMICONDUCTOR DEVICE CONNECTION simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329533). SILVER PATTERNING AND INTERCONNECT PROCESSES simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329535). DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240429051). PHOTORESIST AND FORMATION METHOD THEREOF
- Taiwan semiconductor manufacturing co., ltd. (20240429064). METAL ETCHING WITH REDUCED TILT ANGLE
- Taiwan semiconductor manufacturing co., ltd. (20250087496). METHODS FOR FABRICATING SEMICONDCUTOR STRUCTURES
- Taiwan Semiconductor manufacturing Co., Ltd. patent applications on April 18th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on December 26th, 2024