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Category:H01J37/08
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This category has the following 5 subcategories, out of 5 total.
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Pages in category "H01J37/08"
The following 31 pages are in this category, out of 31 total.
1
- 17835107. MOLTEN LIQUID TRANSPORT FOR TUNABLE VAPORIZATION IN ION SOURCES simplified abstract (Applied Materials, Inc.)
- 18158357. ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18210884. INTEGRATED GAS BOX AND ION SOURCE (Applied Materials, Inc.)
- 18236711. IN-SITU ION BEAM ANGLE MEASUREMENT (Applied Materials, Inc.)
- 18370158. ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES (Applied Materials, Inc.)
- 18504630. FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18605282. Grid Structures Of Ion Beam Etching (IBE) Systems simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18650860. ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
A
- Applied materials, inc. (20240420920). INTEGRATED GAS BOX AND ION SOURCE
- Applied materials, inc. (20250069850). IN-SITU ION BEAM ANGLE MEASUREMENT
- Applied materials, inc. (20250095949). ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Applied Materials, Inc. patent applications on December 19th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 27th, 2025
- Applied Materials, Inc. patent applications on March 20th, 2025
- Applied Materials, Inc. patent applications on March 6th, 2025
S
- Samsung electronics co., ltd. (20240282548). FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF simplified abstract
- Samsung electronics co., ltd. (20240290570). REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND SEMICONDUCTOR WAFER ION IMPLANTATION APPARATUS simplified abstract
- Samsung electronics co., ltd. (20250095960). ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20240222071). Grid Structures Of Ion Beam Etching (IBE) Systems simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240249906). ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 25th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 4th, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
