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Category:G03F7/20
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Pages in category "G03F7/20"
The following 200 pages are in this category, out of 307 total.
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- 17386312. DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)
- 17461744. LITHOGRAPHY CONTAMINATION CONTROL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17462695. NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17463328. SYSTEM AND METHOD OF DISCHARGING AN EUV MASK simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17520933. FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS simplified abstract (International Business Machines Corporation)
- 17585942. METHODS AND SYSTEMS FOR INTEGRATED CIRCUIT PHOTOMASK PATTERNING simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17589575. METHOD OF OVERLAY MEASUREMENT simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17638730. QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17697019. METHOD OF FORMING A PATTERN simplified abstract (Samsung Electronics Co., Ltd.)
- 17701520. ELECTRONIC DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE AND OPERATING METHOD OF ELECTRONIC DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17745576. OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17815412. MEASURING DEVICE, MEASURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING PRODUCT simplified abstract (CANON KABUSHIKI KAISHA)
- 17816078. SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)
- 17837051. SEMICONDUCTOR DEVICE WITH GRATING STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17837543. PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM simplified abstract (Applied Materials, Inc.)
- 17837712. METHOD AND SYSTEM FOR OVERLAY MEASUREMENT simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 17847111. TECHNOLOGIES FOR OVERLAY METROLOGY MARKS simplified abstract (Intel Corporation)
- 17847477. EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 17860139. METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17899263. ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY simplified abstract (META PLATFORMS, INC.)
- 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17939293. APPARATUS FOR REMOVING RESIDUE OF EUV LIGHT SOURCE VESSEL simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17950001. Method and Apparatus for In-Situ Dry Development simplified abstract (TOKYO ELECTRON LIMITED)
- 17951580. MASK LAYOUT DESIGN METHOD, MASK AND INTEGRATED CIRCUIT MANUFACTURING METHODS, MASKS AND INTEGRATED CIRCUITS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17956919. METHOD OF FORMING A PATTERN OF SEMICONDUCTOR DEVICE OF A SEMICONDUCTOR DEVICE ON A SEMICONDUCTOR SUBSTRATE BY USING AN EXTREME ULTRAVIOLET MASK simplified abstract (Samsung Electronics Co., Ltd.)
- 17982761. METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18048748. GRAY TONE UNIFORMITY CONTROL OVER SUBSTRATE TOPOGRAPHY simplified abstract (Applied Materials, Inc.)
- 18059291. SYSTEMS, DEVICES, AND METHODS FOR REGISTERING A SUPERSTRATE OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)
- 18062072. EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18070030. Method of Conductive Material Deposition simplified abstract (Tokyo Electron Limited)
- 18080431. TWO-DIMENSIONAL (2D) PATTERNS USING MULTIPLE EXPOSURES OF ONE-DIMENSIONAL (1D) PHOTOLITHOGRAPHY MASKS OR HOLOGRAPHIC INTERFERENCE LITHOGRAPHY simplified abstract (Google LLC)
- 18083851. PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION simplified abstract (International Business Machines Corporation)
- 18100409. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18103289. METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18107427. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18112803. FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract (International Business Machines Corporation)
- 18120916. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18128574. MASKLESS EXPOSURE DEVICE AND DISPLAY DEVICE simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18133118. METHOD FOR FORMING RESIST PATTERN BY USING EXTREME ULTRAVIOLET LIGHT AND METHOD FOR FORMING PATTERN BY USING THE RESIST PATTERN AS MASK simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18144622. ILLUMINATION CORRECTION APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18145035. SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPER SOLUTION simplified abstract (Intel Corporation)
- 18145038. PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST simplified abstract (Intel Corporation)
- 18147261. GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS simplified abstract (CANON KABUSHIKI KAISHA)
- 18150012. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18151163. LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18151527. METHOD FOR LITHOGRAPHY IN SEMICONDUCTOR FABRICATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18151930. METHOD FOR USING RADIATION SOURCE APPARATUS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18153242. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18153708. METHOD OF OPERATING SEMICONDUCTOR APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18164835. TARGET DEBRIS COLLECTION DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18164841. POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18171598. SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT simplified abstract (Applied Materials, Inc.)
- 18203163. METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18277223. METHODS AND APPARATUS FOR CHARACTERIZING A SEMICONDUCTOR MANUFACTURING PROCESS simplified abstract (ASML NETHERLANDS B.V.)
- 18281993. NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18302375. CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18306995. LITHOGRAPHY SYSTEM AND METHOD OF DETECTING FLUID LEAKAGE IN LIQUID STORAGE TANK OF THE SAME simplified abstract (United Microelectronics Corp.)
- 18310073. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18312825. CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18313203. METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18318801. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18320387. EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18325200. SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18325465. RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18329976. ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18334650. Redistribution Lines and The Method Forming the Same Through Stitching simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18335852. PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18336859. LITHOGRAPHY SYSTEM AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18361361. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18371016. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18377215. Onium Salt, Resist Composition, And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18381335. THINNER COMPOSITION AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18392365. POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE RESIST COMPOSITION (SAMSUNG ELECTRONICS CO., LTD.)
- 18394133. METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMS simplified abstract (Applied Materials, Inc.)
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18404934. METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL INTERPENETRATING SUPER-RESOLUTION HIGH-SPEED LASER simplified abstract (ZHEJIANG UNIVERSITY)
- 18409031. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18413619. HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18416087. SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS simplified abstract (Tokyo Electron Limited)
- 18421783. METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET LIGHT SOURCE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18426723. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18436127. SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18446400. LITHOGRAPHY SYSTEM AND METHODS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447404. DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18480249. SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE AND SEMICONDUCTOR PATTERN TRANSFER SYSTEM simplified abstract (Mitsubishi Electric Corporation)
- 18517070. LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18520093. METHODS FOR MAKING FLOW CELLS simplified abstract (ILLUMINA, INC.)
- 18546879. HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS THEREOF simplified abstract (Lam Research Corporation)
- 18560534. SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF PRODUCING A SEMICONDUCTOR LIGHT-EMITTING DEVICE simplified abstract (SONY GROUP CORPORATION)
- 18581290. EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IMPROVE PATTERN TRANSFER simplified abstract (Applied Materials, Inc.)
- 18587218. EXPOSURE MASK, SEMICONDUCTOR DEVICE USING THE EXPOSURE MASK, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE (SK hynix Inc.)
- 18588680. ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING PRINTING PLATE simplified abstract (FUJIFILM Corporation)
- 18590436. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18593159. IMPRINT METHOD AND TEMPLATE FOR IMPRINTING simplified abstract (Kioxia Corporation)
- 18597316. Material For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601043. CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18609833. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18610965. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN simplified abstract (FUJIFILM Corporation)
- 18615313. FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT (Tokyo Electron Limited)
- 18620262. METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY simplified abstract (Intel Corporation)
- 18626475. HEAT TREATMENT DEVICE AND TREATMENT METHOD simplified abstract (Tokyo Electron Limited)
- 18628911. EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER simplified abstract (FUJIFILM Corporation)
- 18634408. CLEANING SOLUTION AND METHOD OF CLEANING WAFER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18635209. Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma Treatment In Euv Mask simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18638436. SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18643281. METHOD OF OPERATING SEMICONDUCTOR APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18663843. METHOD OF REDUCING UNDESIRED LIGHT INFLUENCE IN EXTREME ULTRAVIOLET EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18665134. SUBSTRATE HOLDER AND METHODS OF USE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18735430. FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE simplified abstract (FUJIFILM Corporation)
- 18738731. METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS (Applied Materials, Inc.)
- 18745211. METHOD OF MANUFACTURING PHOTO MASKS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18747951. SUBSTRATE PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18751384. SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE (SAMSUNG ELECTRONICS CO., LTD.)
- 18808427. ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE (FUJIFILM CORPORATION)
- 18887325. SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARATION METHOD, AND ARTICLE MANUFACTURING METHOD (CANON KABUSHIKI KAISHA)
- 18946683. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18963055. EXTREME ULTRAVIOLET MASK (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18964266. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18970324. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
2
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085812.SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (samsung electronics co., ltd.)
3
A
- Applied materials, inc. (20240280913). SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROVEMENT simplified abstract
- Applied materials, inc. (20240419081). METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
- Applied Materials, Inc. patent applications on August 22nd, 2024
- Applied Materials, Inc. patent applications on December 19th, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on January 23rd, 2025
- Applied Materials, Inc. patent applications on March 6th, 2025
B
C
- Canon kabushiki kaisha (20240178042). SYSTEMS, DEVICES, AND METHODS FOR REGISTERING A SUPERSTRATE OF AN IMPRINT TOOL simplified abstract
- Canon kabushiki kaisha (20240219827). GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS simplified abstract
- Canon kabushiki kaisha (20250093788). SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SEPARATION METHOD, AND ARTICLE MANUFACTURING METHOD
- Canon kabushiki kaisha (20250102925). PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
- CANON KABUSHIKI KAISHA patent applications on February 1st, 2024
- CANON KABUSHIKI KAISHA patent applications on January 30th, 2025
- CANON KABUSHIKI KAISHA patent applications on July 4th, 2024
- CANON KABUSHIKI KAISHA patent applications on March 20th, 2025
- CANON KABUSHIKI KAISHA patent applications on March 27th, 2025
- CANON KABUSHIKI KAISHA patent applications on March 6th, 2025
- CANON KABUSHIKI KAISHA patent applications on May 30th, 2024
- Contemporary amperex technology co., limited (20240264541). EXPOSURE APPARATUS simplified abstract
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED patent applications on August 8th, 2024
F
- Fujifilm corporation (20240264532). TREATMENT LIQUID AND TREATMENT LIQUID HOUSING BODY simplified abstract
- FUJIFILM Corporation (20240316977). FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE simplified abstract
- Fujifilm corporation (20240316977). FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE simplified abstract
- FUJIFILM CORPORATION patent applications on August 8th, 2024
- FUJIFILM Corporation patent applications on September 26th, 2024
G
I
- Intel corporation (20240184209). LITHOGRAPHIC PROCESSES FOR MAKING POLYMER-BASED ELEMENTS simplified abstract
- Intel corporation (20240201586). PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST simplified abstract
- Intel corporation (20240210821). PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST simplified abstract
- Intel corporation (20240210835). SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPER SOLUTION simplified abstract
- Intel corporation (20240241446). METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY simplified abstract
- Intel corporation (20240272547). TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATED METHODS simplified abstract
- Intel Corporation patent applications on August 15th, 2024
- Intel Corporation patent applications on February 29th, 2024
- Intel Corporation patent applications on July 18th, 2024
- Intel Corporation patent applications on June 20th, 2024
- INTEL CORPORATION patent applications on June 20th, 2024
- Intel Corporation patent applications on June 27th, 2024
- Intel Corporation patent applications on June 6th, 2024
- International business machines corporation (20240201583). PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION simplified abstract
- International business machines corporation (20240280899). FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION simplified abstract
- International Business Machines Corporation patent applications on August 22nd, 2024
- International Business Machines Corporation patent applications on June 20th, 2024
K
M
S
- SAMSUNG DISPLAY CO., LTD. patent applications on February 15th, 2024
- SAMSUNG DISPLAY CO., LTD. patent applications on February 1st, 2024
- Samsung Display Co., LTD. patent applications on February 20th, 2025
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240094633). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240112933). SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240118627). METHOD OF CORRECTING OVERLAY, METHOD OF CONTROLLING SEMICONDUCTOR PROCESS, AND SEMICONDUCTOR PROCESSING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240124635). POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240126161). EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung electronics co., ltd. (20240134290). MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract
- Samsung electronics co., ltd. (20240199540). CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240231225). RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240239820). ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240310739). SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240313066). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240319593). THINNER COMPOSITION AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240327338). ORGANIC SALT, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract