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Category:G03F1/64
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Pages in category "G03F1/64"
The following 38 pages are in this category, out of 38 total.
1
- 17692561. METHODS FOR DRY PRINTING CARBON NANOTUBE MEMBRANES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17865027. MASK ASSEMBLY AND DEPOSITION APPARATUS FOR DISPLAY DEVICE INCLUDING THE SAME simplified abstract (Samsung Display Co., Ltd.)
- 18047342. PELLICLE AND METHOD OF USING THE SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18114126. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18118498. PELLICLE AND METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18133937. PELLICLE AND METHOD OF MANUFACTURING THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18236515. ADHESIVE FOR PELLICLE, PELLICLE FOR PHOTO MASK AND METHOD FOR MANUFACTURING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18294072. PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRESSURE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18404861. ADHESIVE COMPOSITION, METHOD FOR PREPARING THE SAME, RETICLE ASSEMBLY INCLUDING THE SAME, AND METHOD FOR FABRICATING RETICLE ASSEMBLY INCLUDING THE SAME simplified abstract (KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY)
- 18404861. ADHESIVE COMPOSITION, METHOD FOR PREPARING THE SAME, RETICLE ASSEMBLY INCLUDING THE SAME, AND METHOD FOR FABRICATING RETICLE ASSEMBLY INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18654329. METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18751858. PELLICLE ASSEMBLY AND METHOD OF MAKING SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
S
- Samsung electronics co., ltd. (20240174902). ADHESIVE COMPOSITION, METHOD FOR PREPARING THE SAME, RETICLE ASSEMBLY INCLUDING THE SAME, AND METHOD FOR FABRICATING RETICLE ASSEMBLY INCLUDING THE SAME simplified abstract
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
- Shin-etsu chemical co., ltd. (20240337921). PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRESSURE simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240094629). PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329517). PELLICLE HAVING VENT HOLE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on February 1st, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240103358). SYSTEM AND STRUCTURE INCLUDING A PELLICLE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240280894). METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240302735). PELLICLE AND METHOD OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240345471). PELLICLE AND METHOD OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240345472). PELLICLE ASSEMBLY AND METHOD OF MAKING SAME simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on March 28th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 17th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 12th, 2024
U
- US Patent Application 18232674. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract
- US Patent Application 18359954. Mask Defect Prevention simplified abstract
- US Patent Application 18360030. PELLICLE DESIGN FOR MASK APPLICATION simplified abstract
- US Patent Application 18362046. PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME simplified abstract