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Category:G03F1/48
Subcategories
This category has the following 4 subcategories, out of 4 total.
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Pages in category "G03F1/48"
The following 10 pages are in this category, out of 10 total.
1
- 18432842. METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK simplified abstract (SK hynix Inc.)
- 18435960. PHOTOLITHOGRAPHY PATTERNING METHOD simplified abstract (KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY)
- 18469743. HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18823930. REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK (SHIN-ETSU CHEMICAL CO., LTD.)
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- Samsung electronics co., ltd. (20240231219). HARD MASK AND SEMICONDUCTOR DEVICE COMPRISING THE SAME simplified abstract
- Samsung Electronics Co., Ltd. patent applications on July 11th, 2024
- Sk hynix inc. (20240176226). METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK simplified abstract
- SK hynix Inc. patent applications on May 30th, 2024
