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Category:CPC H01L21/0337
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Pages in category "CPC H01L21/0337"
The following 54 pages are in this category, out of 54 total.
1
- 18155955. PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18216485. AND DOUBLE PATTERNING STRATEGY WITH PRINTED ERASABLE DUMMIFICATION (Intel Corporation)
- 18238015. METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE (NANYA TECHNOLOGY CORPORATION)
- 18356322. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18395715. PHOTOMASK STRUCTURE AND PATTERNING METHOD simplified abstract (Winbond Electronics Corp.)
- 18511023. METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE (NANYA TECHNOLOGY CORPORATION)
- 18626719. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18660980. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18817646. METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-CONTAINING PRECURSORS (Applied Materials, Inc.)
- 18957867. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (SK hynix Inc.)
- 18966174. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
A
- Advanced micro devices, inc. (20250006496). REMOVING CONDUCTIVE MATERIAL FROM A PEDESTAL OF A SEMICONDUCTOR LID OUTSIDE OF AN AREA CONTACTING A DIE
- Advanced Micro Devices, Inc. patent applications on January 2nd, 2025
- AGC Inc. Patent Application Trends in 2024
- AGC INC. Patent Application Trends in 2024
- Applied materials, inc. (20240266171). BORON CONCENTRATION TUNABILITY IN BORON-SILICON FILMS simplified abstract
- Applied materials, inc. (20250095990). METAL-CONTAINING HARDMASK OPENING METHODS USING BORON-AND-HALOGEN-CONTAINING PRECURSORS
- Applied Materials, Inc. patent applications on August 8th, 2024
- Applied Materials, Inc. patent applications on March 20th, 2025
I
L
S
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240222123). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024
- Shin-Etsu Chemical Co., Ltd. Patent Application Trends in 2024
- Sk hynix inc. (20250087488). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- SK hynix Inc. patent applications on March 13th, 2025
- STMicroelectronics International N.V. Patent Application Trends in 2025
T
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan semiconductor manufacturing company, ltd. (20240242966). PHOTORESIST AND FORMATION METHOD THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240297042). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on July 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 5th, 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- Tokyo Electron Limited patent applications on March 6th, 2025
