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Category:CPC G03F7/039
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Pages in category "CPC G03F7/039"
The following 45 pages are in this category, out of 45 total.
1
- 10x Genomics, Inc. Patent Application Trends in 2024
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18493192. RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18520093. METHODS FOR MAKING FLOW CELLS simplified abstract (ILLUMINA, INC.)
- 18612246. PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND simplified abstract (Samsung Electronics Co., Ltd.)
- 18639380. PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18808427. ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE (FUJIFILM CORPORATION)
F
- Fujifilm corporation (20240427242). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Fujifilm corporation (20240427243). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004374). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- FUJIFILM Corporation Patent Application Trends in 2024
- FUJIFILM CORPORATION patent applications on December 26th, 2024
- FUJIFILM CORPORATION patent applications on January 2nd, 2025
M
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- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240288771). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240319594). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240319595). PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND simplified abstract
- Samsung electronics co., ltd. (20250102914). PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 27th, 2025
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
- SAMSUNG SDI CO., LTD. Patent Application Trends in 2025
- Shin-Etsu Chemical Co., Ltd. Patent Application Trends in 2024
- Sumitomo Chemical Company, Limited Patent Application Trends in 2024
- SUMITOMO CHEMICAL COMPANY, LIMITED Patent Application Trends in 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20250085631). PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
