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Category:C23C16/50
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This category has the following 21 subcategories, out of 21 total.
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Pages in category "C23C16/50"
The following 59 pages are in this category, out of 59 total.
1
- 18122574. APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING PROCESSING simplified abstract (Applied Materials, Inc.)
- 18124495. MULTIWALLED CARBON NANOTUBES BASED FLEXIBLE AND BINDER--FREE ANODE FOR LI-ION BATTERIES simplified abstract (KING FAISAL UNIVERSITY)
- 18166196. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18181077. SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract (Applied Materials, Inc.)
- 18223804. MULTIWALLED CARBON NANOTUBES BASED FLEXIBLE AND BINDER-FREE ANODE FOR LI-ION BATTERIES simplified abstract (KING FAISAL UNIVERSITY)
- 18228220. METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18278276. TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS simplified abstract (Lam Research Corporation)
- 18416304. Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing simplified abstract (Applied Materials, Inc.)
- 18416990. SEMICONDUCTOR MANUFACTURING DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18434831. Display Panel, Preparation Method and Display Apparatus simplified abstract (HKC CORPORATION LIMITED)
- 18512923. METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract (Samsung Electronics Co., Ltd.)
- 18523060. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18599767. Processing Chamber With Multiple Plasma Units simplified abstract (Applied Materials, Inc.)
- 18608005. SELECTIVE COBALT DEPOSITION ON COPPER SURFACES simplified abstract (Applied Materials, Inc.)
- 18609278. INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18624655. PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kokusai Electric Corporation)
- 18706426. FOLDABLE SUBSTRATES AND METHODS OF MAKING (Corning Incorporated)
- 18720437. CARBON RICH LAYER FOR SCALE CONTROL (Schlumberger Technology Corporation)
- 18740699. METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM (ASM IP Holding B.V.)
- 18773946. GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER (Applied Materials, Inc.)
- 18961055. GAS TRANSPORT SYSTEM (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18973635. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (Kokusai Electric Corporation)
- 18973659. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM (Kokusai Electric Corporation)
- 18975131. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
2
A
- Applied materials, inc. (20240247376). Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing simplified abstract
- Applied materials, inc. (20240249918). Processing Chamber With Multiple Plasma Units simplified abstract
- Applied materials, inc. (20240258153). APPARATUS AND METHODS FOR SEMICONDUCTOR PROCESSING simplified abstract
- Applied materials, inc. (20240304423). SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES simplified abstract
- Applied materials, inc. (20250006474). INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
- Applied materials, inc. (20250006487). DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
- Applied Materials, Inc. patent applications on August 1st, 2024
- Applied Materials, Inc. patent applications on February 13th, 2025
- Applied Materials, Inc. patent applications on February 20th, 2025
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on January 23rd, 2025
- Applied Materials, Inc. patent applications on January 2nd, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on September 12th, 2024
B
I
S
- Samsung electronics co., ltd. (20240213017). METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract
- Samsung electronics co., ltd. (20240266148). SEMICONDUCTOR MANUFACTURING DEVICE simplified abstract
- Samsung electronics co., ltd. (20240282573). METHOD AND SYSTEM FOR PROCESSING SUBSTRATES simplified abstract
- Samsung electronics co., ltd. (20240355499). SPIRAL GRAPHENE NANOCRYSTAL, GRAPHENE FILM, INTERCONNECTSTRUCTURE, ELECTRONIC DEVICE INCLUDING SAME, AND METHOD OF FABRICATING INTERCONNECT STRUCTURE simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on August 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
- Schlumberger technology corporation (20250084735). CARBON RICH LAYER FOR SCALE CONTROL
- Schlumberger Technology Corporation patent applications on March 13th, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20250092892). GAS TRANSPORT SYSTEM
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024