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Category:C23C16/08
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This category has the following 11 subcategories, out of 11 total.
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Pages in category "C23C16/08"
The following 9 pages are in this category, out of 9 total.
1
- 17835073. METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH COMPOSITE CONTACT STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18395788. ETCHING METHOD AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18396835. METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM simplified abstract (ASM IP Holding B.V.)
- 18517837. VAPOR PHASE PRECURSOR DELIVERY SYSTEM simplified abstract (ASM IP Holding B.V.)
- 18614912. GAS DELIVERY FOR TUNGSTEN-CONTAINING LAYER simplified abstract (Applied Materials, Inc.)
- 18818298. VAPOR DEPOSITION PROCESSES (ASM IP Holding B.V.)
- 18970001. METHODS FOR DEPOSITING A MOLYBDENUM NITRIDE FILM ON A SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES INCLUDING A MOLYBDENUM NITRIDE FILM (ASM IP Holding B.V.)
- 18987577. DEPOSITION OF TRANSITION METAL-COMPRISING MATERIAL (ASM IP Holding B.V.)
- 19000548. NUCLEATION-FREE DEPOSITION (Lam Research Corporation)