Tokyo electron limited (20250144667). SUBSTRATE-PROCESSING METHOD
SUBSTRATE-PROCESSING METHOD
Organization Name
Inventor(s)
Yoshinori Morisada of Yamanashi JP
SUBSTRATE-PROCESSING METHOD
This abstract first appeared for US patent application 20250144667 titled 'SUBSTRATE-PROCESSING METHOD
Original Abstract Submitted
a substrate-processing method includes a) forming a flowable oligomer on a substrate, the flowable oligomer containing carbon; and b) exposing the substrate to a plasma of a modification gas containing carbon and hydrogen, thereby modifying the flowable oligomer and forming a carbon-containing film.