CLEANING METHOD AND FILM-FORMING APPARATUS

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CLEANING METHOD AND FILM-FORMING APPARATUS

This abstract first appeared for US patent application 20250128298 titled 'CLEANING METHOD AND FILM-FORMING APPARATUS

Original Abstract Submitted

a cleaning method for cleaning an interior of a process chamber includes (a) carrying a substrate out of the interior of the process chamber, the substrate being subjected to film formation in a state in which the substrate is supported by a substrate support; and (b) after (a), cleaning at least one of the substrate support or a surrounding portion around the substrate support. the cleaning in (b) includes rotating the substrate support and moving one of the substrate support or a nozzle gas discharge mechanism relative to another of the substrate support or the nozzle gas discharge mechanism, in conjunction with discharging a cleaning gas toward at least one of the substrate support or the surrounding portion from the discharge hole of the nozzle gas discharge mechanism, thereby partially cleaning a film-formed region of at least one of the substrate support or the surrounding portion.