WAFER TEMPERATURE MEASUREMENT FOR WET ETCHING BATH APPLICATIONS

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Inventor(s)

WAFER TEMPERATURE MEASUREMENT FOR WET ETCHING BATH APPLICATIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240242987 titled 'WAFER TEMPERATURE MEASUREMENT FOR WET ETCHING BATH APPLICATIONS

The abstract describes a wet etch semiconductor-processing system with a sensor optically coupled to a semiconductor sample to measure spectral intensities of bandgap photoluminescence light.

Wet etch semiconductor-processing system
Wet processing bath filled with processing liquid
Semiconductor samples placed vertically in parallel and immersed in the processing liquid
Sensor optically coupled to a semiconductor sample
Sensor forms an illumination beam, collects bandgap photoluminescence light, and measures spectral intensities
Sensor directs the illumination beam onto the surface of the semiconductor sample and receives the bandgap photoluminescence light

Potential Applications: - Semiconductor manufacturing - Quality control in semiconductor production - Research and development in semiconductor technology

Problems Solved: - Accurate measurement of spectral intensities of bandgap photoluminescence light - Real-time monitoring of semiconductor samples during wet etch processing

Benefits: - Improved process control in semiconductor manufacturing - Enhanced quality assurance in semiconductor production - Increased efficiency and accuracy in research and development

Commercial Applications: Title: "Advanced Wet Etch Semiconductor-Processing System for Enhanced Quality Control" This technology can be used in semiconductor fabrication facilities to optimize production processes, improve product quality, and streamline research and development efforts in the semiconductor industry.

Questions about Wet Etch Semiconductor-Processing System: 1. How does the sensor in the system measure spectral intensities of bandgap photoluminescence light? The sensor forms an illumination beam, collects the bandgap photoluminescence light excited by the beam, and measures the spectral intensities in the vicinity of the semiconductor bandgap wavelength.

2. What are the key advantages of using a wet etch semiconductor-processing system in semiconductor manufacturing? The system allows for accurate measurement and real-time monitoring of semiconductor samples during wet etch processing, leading to improved process control and quality assurance in production.

Original Abstract Submitted

aspects of the disclosure provide a wet etch semiconductor-processing system, which can include a wet processing bath configured to be filled with a processing liquid and configured for one or more semiconductor samples to be placed vertically in parallel therein and immersed in the processing liquid, and a sensor optically coupled to one of the semiconductor samples. the sensor can be configured to form an illumination beam, collect bandgap photoluminescence (pl) light excited by the illumination beam onto a surface of the semiconductor sample at an illuminated spot, and measure spectral intensities of the bandgap pl light in a vicinity of a semiconductor bandgap wavelength of the semiconductor sample. the sensor can be arranged with respect to the wet processing bath such that the sensor directs the illumination beam onto the surface of the semiconductor sample at the illuminated spot and receives the bandgap pl light from the illuminated spot.