Tokyo electron limited (20240242976). GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract
GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
Organization Name
Inventor(s)
Atsushi Sawachi of Miyagi (JP)
Takahiro Matsuda of Osaka (JP)
Kazunari Watanabe of Osaka (JP)
GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240242976 titled 'GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
The gas supply device described in the patent application is designed to save space and efficiently supply a mixed gas with stable component concentrations to a processing chamber.
- The device includes multiple fluid control units, each with a flow path for gas and fluid control devices in the middle of the path.
- A merging flow path connects the fluid control units to a single gas outlet, allowing for the introduction of gas through multiple connecting portions.
- The connecting portions are symmetrically arranged around the gas outlet, with multiple fluid control units connected to each connecting portion.
Potential Applications: - Semiconductor manufacturing processes - Chemical processing industries - Laboratory research settings
Problems Solved: - Efficient gas supply to processing chambers - Space-saving design for gas supply systems - Maintaining stable component concentrations in mixed gases
Benefits: - Faster and more reliable gas supply - Consistent component concentrations - Space optimization in industrial settings
Commercial Applications: Gas supply devices like this could be used in semiconductor fabrication facilities, chemical plants, and research laboratories to enhance process efficiency and reliability.
Questions about the Gas Supply Device: 1. How does the symmetric arrangement of connecting portions contribute to the efficiency of gas supply? 2. What specific industries could benefit the most from this innovative gas supply device?
Frequently Updated Research: Stay informed about the latest advancements in gas supply technology and related innovations to optimize industrial processes and research applications.
Original Abstract Submitted
a gas supply device capable of saving space and supplying a mixed gas having components with stable concentration to a processing chamber in a short time includes: a plurality of fluid control units each including a flow path through which gas flows, and fluid control devices provided in the middle of the flow path; a merging flow path including a plurality of connecting portions fluidly connected to the plurality of fluid control units and a single gas outlet portion which derives the gas introduced through the plurality of connecting portions; wherein a plurality of connecting portions is arranged symmetrically with respect to the gas outlet portion in the flow path direction of the merging flow path, and two or more fluid control units are fluidly connected to each of the plurality of connecting portions.