Tokyo electron limited (20240242934). PLASMA PROCESSING APPARATUS simplified abstract
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Masaki Hirayama of Fuchu City (JP)
PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240242934 titled 'PLASMA PROCESSING APPARATUS
The abstract of the patent application describes a plasma processing apparatus with a resonator in the waveguide part that provides a waveguide path for an electromagnetic wave to be discharged into a plasma generation space.
- The plasma processing apparatus includes a chamber, a substrate support, a discharger, and a waveguide part.
- The waveguide part contains a resonator with at least one slit for the electromagnetic wave to resonate and propagate in the waveguide path.
- The resonator enhances the efficiency of the electromagnetic wave discharge into the plasma generation space.
- The slit in the resonator allows for controlled propagation of the electromagnetic wave within the waveguide path.
- This innovation aims to improve the performance and precision of plasma processing in various applications.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Surface modification processes
Problems Solved: - Enhanced control over plasma generation - Improved uniformity in plasma processing - Increased efficiency in material processing
Benefits: - Higher quality and precision in plasma processing - Reduced processing time and costs - Enhanced overall productivity in manufacturing processes
Commercial Applications: Title: Advanced Plasma Processing Apparatus for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to improve the efficiency and quality of plasma processing, leading to higher yields and reduced production costs.
Questions about Plasma Processing Apparatus: 1. How does the resonator in the waveguide part enhance the performance of the plasma processing apparatus? The resonator in the waveguide part improves the efficiency of the electromagnetic wave discharge into the plasma generation space by providing a controlled path for the wave to propagate.
2. What are the potential applications of this plasma processing apparatus beyond semiconductor manufacturing? This plasma processing apparatus can also be used in thin film deposition, surface modification processes, and other material processing applications.
Original Abstract Submitted
a plasma processing apparatus includes a chamber, a substrate support provided within the chamber, a discharger provided to discharge an electromagnetic wave into a plasma generation space, and a waveguide part configured to supply the electromagnetic wave to the discharger. the waveguide part includes a resonator that provides a waveguide path, and the resonator includes at least one slit having a longitudinal direction in a propagation direction in which the electromagnetic wave resonating within the resonator propagates in the waveguide path.
