Taiwan semiconductor manufacturing company, ltd. (20250062139). FURNACE INNER TUBE FOR PROCESS UNIFORMITY
FURNACE INNER TUBE FOR PROCESS UNIFORMITY
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Chien-Chia Cheng of Hsinchu (TW)
Hsueh-Chang Sung of Hsinchu (TW)
FURNACE INNER TUBE FOR PROCESS UNIFORMITY
This abstract first appeared for US patent application 20250062139 titled 'FURNACE INNER TUBE FOR PROCESS UNIFORMITY
Original Abstract Submitted
embodiments of the present disclosure provide a furnace for semiconductor processing that includes an inner tube defining a reaction chamber and including a sidewall defined along a longitudinal axis of the inner tube and including one or more slits defined through the sidewall in a radial direction with respect to the longitudinal axis. the one or more slits include at least one of a first slit with a width in a range between 10 mm and 100 mm, or a plurality of separate slits with a total number in a range between 2 and 15. the inner tube includes a closed end substantially enclosing the reaction chamber and an open end opposite the closed end with respect to the longitudinal axis. the reaction chamber is configured to be loaded with one or more semiconductor wafers via the open end.