Taiwan semiconductor manufacturing co., ltd. (20250123576). SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
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SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
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taiwan semiconductor manufacturing co., ltd.
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SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
This abstract first appeared for US patent application 20250123576 titled 'SYSTEMS FOR MANUFACTURING SEMICONDUCTOR DEVICES
Original Abstract Submitted
in a method of cleaning a lithography system, during idle mode, a stream of air is directed, through a first opening, into a chamber of a wafer table of an euv lithography system. one or more particles is extracted by the directed stream of air from surfaces of one or more wafer chucks in the chamber of the wafer table. the stream of air and the extracted one or more particle are drawn, through a second opening, out of the chamber of the wafer table.