PHOTORESIST COMPOSITION

Organization Name

taiwan semiconductor manufacturing co., ltd.

Inventor(s)

Ming-Hui Weng of New Taipei City TW

Wei-Han Lai of New Taipei City TW

Ching-Yu Chang of Yilang County TW

PHOTORESIST COMPOSITION

This abstract first appeared for US patent application 20250116931 titled 'PHOTORESIST COMPOSITION

Original Abstract Submitted

a photoresist composition includes a solvent and a polymer. the polymer comprises a polymer backbone, an acid labile group monomer, a photo acid generator monomer and a quencher monomer. the acid labile group monomer is bonded to the polymer backbone. the acid labile group monomer is acid cleavable. the photo acid generator monomer is bonded to the polymer backbone. the quencher monomer is bonded to the polymer backbone.