Taiwan semiconductor manufacturing co., ltd. (20250098280). SEMICONDUCTOR METHOD AND DEVICE
SEMICONDUCTOR METHOD AND DEVICE
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
SEMICONDUCTOR METHOD AND DEVICE
This abstract first appeared for US patent application 20250098280 titled 'SEMICONDUCTOR METHOD AND DEVICE
Original Abstract Submitted
a method includes forming a fin extending from a substrate; depositing a liner over a top surface and sidewalls of the fin, where the minimum thickness of the liner is dependent on selected according to a first germanium concentration of the fin; forming a shallow trench isolation (sti) region adjacent the fin; removing a first portion of the liner on sidewalls of the fin, the first portion of the liner being above a topmost surface of the sti region; and forming a gate stack on sidewalls and a top surface of the fin, where the gate stack is in physical contact with the liner.