Taiwan semiconductor manufacturing co., ltd. (20250095988). COATING COMPOSITION FOR PHOTOLITHOGRAPHY
COATING COMPOSITION FOR PHOTOLITHOGRAPHY
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Yen-Ting Chen of Taipei City TW
COATING COMPOSITION FOR PHOTOLITHOGRAPHY
This abstract first appeared for US patent application 20250095988 titled 'COATING COMPOSITION FOR PHOTOLITHOGRAPHY
Original Abstract Submitted
methods for making a semiconductor device using an improved barc (bottom anti-reflective coating) are provided herein. the improved barc comprises a polymer formed from at least a styrene monomer having at least one or two hydrophilic substituents. the monomer(s) and substituents can be varied as desired to obtain a balance between film adhesion and wet etch resistance. also provided is a semiconductor device produced using such methods.
