Taiwan semiconductor manufacturing co., ltd. (20250085476). PHOTONIC DEVICE AND METHOD OF MAKING
PHOTONIC DEVICE AND METHOD OF MAKING
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Chen-Hao Huang of Hsinchu (TW)
Chien-Chang Lee of Hsinchu (TW)
PHOTONIC DEVICE AND METHOD OF MAKING
This abstract first appeared for US patent application 20250085476 titled 'PHOTONIC DEVICE AND METHOD OF MAKING
Original Abstract Submitted
a photonic device includes a silicon layer, wherein the silicon layer includes a waveguide portion. the photonic device further includes a cladding layer over the waveguide portion, wherein the cladding layer partially exposes a surface of the waveguide portion. the photonic device further includes a low refractive index layer in direct contact with the cladding layer, wherein the low refractive index layer comprises silicon oxide, silicon carbide, silicon oxynitride, silicon carbon oxynitride, aluminum oxide or hafnium oxide. the photonic device further includes an interconnect structure over the low refractive index layer.