Taiwan semiconductor manufacturing co., ltd. (20240429067). DYNAMIC EXHAUST FOR CHEMICAL PROCESSING
DYNAMIC EXHAUST FOR CHEMICAL PROCESSING
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Yi-Chang Chen of Hsinchu City (TW)
Yao Hwan Kao of Hsinchu County (TW)
DYNAMIC EXHAUST FOR CHEMICAL PROCESSING
This abstract first appeared for US patent application 20240429067 titled 'DYNAMIC EXHAUST FOR CHEMICAL PROCESSING
Original Abstract Submitted
the present disclosure describes a processing system that includes a stage configured to hold a substrate thereon and an exhaust system. the exhaust system can include a perforated plate with a exhaust holes and an exhaust port. the perforated plate can be positioned between the substrate and the exhaust port. each of the exhaust holes includes a shutter.