Taiwan semiconductor manufacturing co., ltd. (20240429064). METAL ETCHING WITH REDUCED TILT ANGLE
METAL ETCHING WITH REDUCED TILT ANGLE
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Chao-Hsuan Chen of Hsinchu (TW)
Chang-Han Tsai of Hsinchu (TW)
Ryan Chia-Jen Chen of Hsinchu (TW)
METAL ETCHING WITH REDUCED TILT ANGLE
This abstract first appeared for US patent application 20240429064 titled 'METAL ETCHING WITH REDUCED TILT ANGLE
Original Abstract Submitted
methods for etching metal, such as for processing a metal gate, are provided. a method includes forming a hard mask over the metal, wherein the hard mask includes a sidewall defining an opening; and performing a plasma etching process including cycles of depositing a carbon nitride film on the sidewall and etching the metal.
Categories:
- Taiwan semiconductor manufacturing co., ltd.
- Chao-Hsuan Chen of Hsinchu (TW)
- I-Wei Yang of Yilan (TW)
- Chang-Han Tsai of Hsinchu (TW)
- Shu-Uei Jang of Hsinchu (TW)
- Shu-Yuan Ku of Hsinchu (TW)
- Yih-Ann Lin of Hsinchu (TW)
- Ryan Chia-Jen Chen of Hsinchu (TW)
- H01L21/3213
- H01L21/02
- H01L21/033
- H01L21/28
- H01L29/66
- CPC H01L21/32136