Seurat Technologies, Inc. (20250010543). Electron Beam Patterning System in Additive Manufacturing
Electron Beam Patterning System in Additive Manufacturing
Organization Name
Inventor(s)
James A. Demuth of Woburn MA US
Erik Toomre of Los Altos CA US
Francis L. Leard of Sudbury MA US
Kourosh Kamshad of Hudson NH US
Heiner Fees of Bietigheim-Bissingen DE
Eugene Berdichevsky of Oakland CA US
Electron Beam Patterning System in Additive Manufacturing
This abstract first appeared for US patent application 20250010543 titled 'Electron Beam Patterning System in Additive Manufacturing
Original Abstract Submitted
a method and an apparatus involve applying a pattern on an addressable patternable cathode unit. the cathode unit is stimulated to emit an electron beam pattern. a patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufacturing or to an electron beam addressed light valve for controlling spatial patterns on an optical signal for powder bed manufacturing.
