Samsung electronics co., ltd. (20250137136). LAYER DEPOSITION APPARATUS AND LAYER DEPOSITION METHOD
LAYER DEPOSITION APPARATUS AND LAYER DEPOSITION METHOD
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LAYER DEPOSITION APPARATUS AND LAYER DEPOSITION METHOD
This abstract first appeared for US patent application 20250137136 titled 'LAYER DEPOSITION APPARATUS AND LAYER DEPOSITION METHOD
Original Abstract Submitted
a layer deposition apparatus includes a process chamber configured to provides a space for processing a substrate, the process chamber including an upper chamber and a lower chamber that define an inner space; a substrate support disposed within the process chamber and configured to support the substrate; a lamp heating portion disposed above the upper chamber outside the process chamber and including a plurality of light sources configured to irradiate light onto the substrate through the upper chamber; and an interference thin layer pattern disposed on an upper surface of the upper chamber and configured to reflect at least a portion of light from the plurality of light sources.